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Effects of subsurface damage on the photoluminescence of zinc oxide.

机译:地下损伤对氧化锌光致发光的影响。

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摘要

Scope and method of study. The effects of ultrafine finishing processes, such as etching, chemomechanical polishing and mechanical polishing, on the photoluminescence (PL) of single crystal (wurtzite) seeded-chemical-vapor-transport grown bulk ZnO are presented. Spectrally resolved luminescence from (0001)-oriented samples was studied using a conventional PL system for sample temperatures ranging from 0--300 K. PL from each of the prepared surfaces was measured, and changes in the spectral content, temperature dependence and intensity introduced by polishing are assessed. Room temperature PL results are compared to a direct measure of subsurface damage obtained by axial ion channeling.; Results and conclusions. Dominant bound-exciton emission, two-electron satellites, and optical phonon replicas of higher-energy peaks characterize the low-temperature PL for each of the prepared surfaces. The observation of free-exciton emission at 4.2 K for both the etched and chemomechanically polished surfaces demonstrates the high quality of material used for this study. The temperature dependence (0--300 K) of the free-exciton peak for chemomechanically polished ZnO is presented in this study. Room temperature PL results for all of the polished samples are compared to the amount of lattice disorder introduced by polishing, as measured by axial ion channeling, and an overall trend of decreased PL efficiency with increased lattice disorder is observed. The introduction of new low-temperature PL peaks with increased disorder is also observed. Mechanically polished samples are seen to exhibit hot-exciton emission and a donor-acceptor recombination not observed for any of the other surfaces. Each of these new peaks is attributed to near-surface damage introduced by polishing. The effect of hydrogen treatment on the 4.2 K PL of ZnO was also investigated. Relative intensities of the bound-exciton peaks were observed to change with H treatment and the 3.361 eV peak is tentatively assigned as a H-related bound-exciton peak. Room temperature PL spectroscopy is shown to exhibit potential as a sensitive tool for the characterization of subsurface damage in polished ZnO. Results from this study will aid in identifying the processing conditions which show promise for producing high-quality substrates for use in the homoepitaxial growth of ZnO or the heteroepitaxial growth of GaN thin films for use as short wavelength light emitters.
机译:研究范围和方法。提出了超细加工工艺,如蚀刻,化学机械抛光和机械抛光,对单晶(纤锌矿)晶种化学蒸气传输生长的块状ZnO的光致发光(PL)的影响。使用常规PL系统在0--300 K范围内的样品温度下研究了(0001)取向样品的光谱分辨发光。测量了每个制备表面的PL,并测量了光谱含量,温度依赖性和强度的变化通过抛光进行评估。将室温PL结果与通过轴向离子通道获得的地下破坏的直接量度进行比较。结果和结论。主导束缚激子发射,两电子卫星和高能峰的光声子复制品是每个准备表面的低温PL的特征。对蚀刻和化学机械抛光的表面在4.2 K处自由激子发射的观察证明了用于这项研究的材料的高质量。本研究介绍了化学机械抛光的ZnO的自由激子峰的温度依赖性(0--300 K)。将所有抛光样品的室温PL结果与通过轴向离子通道测量的抛光引入的晶格缺陷数量进行比较,观察到总体效率随晶格缺陷增加而降低的总体趋势。还观察到引入了具有增加的无序性的新的低温PL峰。观察到机械抛光的样品表现出热激子发射,并且对于其他任何表面均未观察到供体-受体复合。这些新峰中的每个峰均归因于抛光引起的近表面损伤。还研究了氢处理对ZnO的4.2 K PL的影响。观察到结合激子峰的相对强度随H处理而变化,并且3.361 eV峰暂定为H相关的结合激子峰。室温PL光谱显示出潜力,可作为表征抛光ZnO中亚表面损伤的灵敏工具。这项研究的结果将有助于确定工艺条件,这些条件表明有望生产出高质量的衬底,以用于ZnO的同质外延生长或用作短波长发光体的GaN薄膜的异质外延生长。

著录项

  • 作者

    Hamby, David William.;

  • 作者单位

    Oklahoma State University.;

  • 授予单位 Oklahoma State University.;
  • 学科 Engineering Mechanical.
  • 学位 Ph.D.
  • 年度 2003
  • 页码 138 p.
  • 总页数 138
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 机械、仪表工业;
  • 关键词

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