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Growth and characterization of zinc oxide nanowires and thin films.

机译:氧化锌纳米线和薄膜的生长和表征。

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摘要

ZnO was studied in this dissertation for use in one-dimensional nanoscale devices, optoelectronics, and electronic applications. The synthesis, structural, and optical properties of ZnO and MgO nanowires as nanoscale materials were investigated. The crystallinity, electrical, optical and magnetic properties of undoped and phosphorous doped ZnO thin films for p-type ZnO were examined.; The ZnO nanowires were fabricated using catalyst-driven molecular beam epitaxy. Site specific growth of ZnO and MgO nanowires was observed on Ag coated Si and Al2O3 substrates. The structural and compositional studies indicated that the deposition of Zn and Mg resulted in two different types of radial heterostructured (Zn,Mg)O nanowires.; The effect of phosphorus doping on the electrical and optical properties of ZnO grown via pulsed laser beam deposition was studied. Phosphorus doping yields enhanced n-type behavior in as-deposited films, indicating the formation of shallow donor states. Annealing in 100 mTorr of oxygen led to the conversion of n-type behavior in as-deposited films to semi-insulating behavior in the annealed films. For the annealed film, these results appear to reflect phosphorus substitution on the O sites.; The characteristics of device structures that employ phosphorus-doped (Zn,Mg)O have been examined in a effort to delineate the carrier type behavior in this material. The capacitance-voltage properties of metal/insulator/P-doped (Zn,Mg)O diode structures were measured and found to exhibit a polarity consistent with the P-doped (Zn,Mg)O layer being p-type.; The photo-response of ZnO doped with phosphorus was investigated. A correlation between near band-edge emission and carrier density is observed. This is similar to results found for ZnO in which the carrier density is increased via annealing in a reducing ambient. Upon annealing in an oxidizing environment, the near band-edge emission decreased for both the undoped and phosphorus doped ZnO films.; The magnetic properties of phosphorus doped ZnO thin films were examined after high dose Mn implantation. Films show room temperature hysteresis in magnetization loops. The saturation magnetization and coercivity of the implanted single-phase films were both strong functions of the initial annealing temperature. (Abstract shortened by UMI.)
机译:本文对一维纳米器件,光电器件和电子应用中使用的ZnO进行了研究。研究了ZnO和MgO纳米线作为纳米材料的合成,结构和光学性质。检查了用于p型ZnO的未掺杂和磷掺杂的ZnO薄膜的结晶度,电学,光学和磁性。 ZnO纳米线是使用催化剂驱动的分子束外延制造的。在涂银的Si和Al 2 O 3 衬底上观察到ZnO和MgO纳米线的特定位生长。结构和成分研究表明,Zn和Mg的沉积导致两种不同类型的径向异质结构(Zn,Mg)O纳米线。研究了磷掺杂对通过脉冲激光束沉积生长的ZnO的电学和光学性质的影响。磷掺杂在沉积薄膜中增强了 n 型行为,表明形成了浅的施主态。在100 mTorr的氧气中退火会导致沉积薄膜中的n型行为转变为退火薄膜中的半绝缘行为。对于退火膜,这些结果似乎反映了磷在O位上的取代。为了确定这种材料中的载流子类型行为,已经研究了采用磷掺杂的(Zn,Mg)O的器件结构的特性。测量金属/绝缘体/ P掺杂的(Zn,Mg)O二极管结构的电容-电压特性,发现其极性与P掺杂的(Zn,Mg)O层为p型一致。研究了掺磷的ZnO的光响应。观察到近带边缘发射与载流子密度之间的相关性。这与ZnO的结果相似,其中在降低的环境中通过退火增加了载流子密度。在氧化环境中退火后,未掺杂和掺磷的ZnO薄膜的近带边发射均降低。高剂量锰注入后,研究了掺磷的ZnO薄膜的磁性。薄膜在磁化回路中显示出室温磁滞。注入的单相膜的饱和磁化强度和矫顽力都是初始退火温度的强函数。 (摘要由UMI缩短。)

著录项

  • 作者

    Heo, Young-Woo.;

  • 作者单位

    University of Florida.;

  • 授予单位 University of Florida.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2003
  • 页码 p.6277
  • 总页数 195
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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