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Novel physical properties of glancing angle deposited nanowire arrays for spintronics.

机译:自旋电子学的掠射角沉积纳米线阵列的新型物理特性。

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摘要

Highly oriented perpendicular nanowire arrays with novel structures were fabricated by the technique of glancing angle deposition with substrate rotation. The nanowires are considered as a potential tool for the fundamental study of spin transport, and promising candidates for applications in perpendicular recording media. The detailed spin arrangements and dynamics in such devices have not been explored yet, and can only be understood if the atomic scale structure of the devices is precisely known.; The growth and resulting crystallography of self assembled Cu nanowire arrays deposited both on native oxide Si(100) and H-terminated Si(110) substrates, respectively, were studied and compared. On native oxide Si(100), the nanowires exhibited a strong (110) texture for a deposition angle theta = 75° with rotational symmetry of the low energy Cu[111] directions about the wire's long axis. On H-terminated Si(110), the wires have an epitaxial orientation relationship with the substrate up to the critical height limit of 300 nm. Individual nanowires were confirmed to be single crystal by examination by transmission electron microscopy. The critical height for epitaxial growth is maximal (2800 nm) at a deposition angle theta = 35° and decreases rapidly with increasing deposition angle.; Atomic self-shadowing and surface diffusion, which depend on the incidence angle, have a strong effect on morphology and texture formation. As the angle of incidence is increased, Cu grows as isolated columns with a spacing that increases as the angle of incidence is increased. Based on these observations, the growth mechanisms in glancing angle deposited materials and the theory of structural transitions in epitaxial overlayers of thin films, a theory for the growth mode in epitaxial nanowire arrays is proposed with a description of the recrystallization process that takes place above the critical height.; The epitaxial Cu nanoarrays were used as seed layers to grow Ni 80Fe20 nanowire arrays. The nanowires exhibited a strong [311] texture, with the [111] directions having rotational symmetry about the wire's long axis. At low aspect ratios (∼0.5--1.5), the angular remanence lies on the surface of a cone with its axis along the substrate normal. A model to explain this behavior is presented.
机译:通过衬底旋转旋转掠角沉积技术,制备了具有新颖结构的高取向垂直纳米线阵列。纳米线被认为是自旋运输基础研究的潜在工具,并且有望用于垂直记录介质。还没有探索这种装置中的详细的自旋排列和动力学,并且只有在精确知道装置的原子尺度结构时才能理解。研究和比较了分别沉积在天然氧化物Si(100)和H端接的Si(110)衬底上的自组装Cu纳米线阵列的生长和所得的晶体学。在天然氧化物Si(100)上,纳米线在沉积角theta = 75°的情况下表现出很强的(110)织构,并且低能Cu [111]方向绕线的长轴旋转对称。在H端接的Si(110)上,导线与衬底的外延取向关系高达300 nm的临界高度极限。通过透射电子显微镜检查确认单个纳米线为单晶。外延生长的临界高度在沉积角θ= 35°时最大(2800 nm),并随沉积角的增加而迅速减小。取决于入射角的原子自阴影化和表面扩散对形态和纹理形成有很大影响。随着入射角的增加,Cu随隔离柱的生长而增长,其间距随着入射角的增加而增加。基于这些观察,掠射角沉积材料的生长机理以及薄膜外延叠层中结构转变的理论,提出了外延纳米线阵列中生长模式的理论,并描述了在衬底上方发生的重结晶过程。临界高度。外延Cu纳米阵列用作种子层以生长Ni 80Fe20纳米线阵列。纳米线表现出很强的[311]织构,其中[111]方向具有绕线的长轴旋转的对称性。在低纵横比(〜0.5--1.5)下,剩磁位于圆锥体的表面上,其轴线沿基板法线方向。提供了一个解释这种行为的模型。

著录项

  • 作者

    Alouach, Hamid.;

  • 作者单位

    The University of Alabama.;

  • 授予单位 The University of Alabama.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2004
  • 页码 127 p.
  • 总页数 127
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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