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Characterization of Extended Defects and their Influence on the Performance of 4Hydrogen-Silicon Carbide Devices.

机译:扩展缺陷的特征及其对4H碳化硅装置性能的影响。

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摘要

The quality of 4H-SiC epitaxial layers have considerably improved in recent years owing to the reduction in the density of many crystallographic defects. Yet, since the size of the active area of power devices is large, the presence of defects in epilayers still hampers device yield. Some extended defects, such as the triangular defect, are commonly found in epilayers and have a substantial influence on device performance. Threading dislocations remain prevalent in epilayers, but our knowledge on their impact on devices is not complete. Moreover, our understating of the relation between the defect microstructure, the electronic structure and the resultant influence on device properties is lacking. The objective of this dissertation was to examine the impact of major extended defects found in current epilayers on device performance, and to characterize their microstructure and electronic-structure to gain an understanding on their behavior in devices.;The effects of threading dislocation on the leakage and breakdown characteristics of avalanche photodiodes containing a single dislocation were studied. Both screw and edge dislocations were identified in diodes which exhibited premature breakdown and increased leakage currents compared to diodes free of extended defects. Known leakage mechanisms were examined and their feasibility to explain the measured leakage current caused by the threading dislocations is discussed.;The electronic structure at the dislocation core of threading edge and screw dislocations was studied by means of electron holography. The threading screw dislocations in n-type samples were found to be negatively charged, which indicated the presence of bandgap traps at the core. Holography measurements were performed on multiple dislocations from epilayers with different doping densities. Based on these measurements and using a model of closely spaced traps, the trap density and their ionization energies have been estimated.;The edge dislocation electronic structure was studied under the electron beam induced current technique. The charge collection efficiency contrast as a function of doping density and temperature was explained using a model of core traps forming a single level in the bandgap.;The presence of the triangular defect on the breakdown and leakage characteristics of junction barrier Schottky diodes was studied and was found to be particularly detrimental to devices. The triangular defect microstructure was determined and correlated to its breakdown and leakage behavior in diodes.
机译:由于减少了许多晶体学缺陷的密度,近年来4H-SiC外延层的质量已大大提高。然而,由于功率器件的有源区的尺寸很大,所以外延层中缺陷的存在仍会妨碍器件的成品率。一些扩展缺陷(例如三角形缺陷)通常在外延层中发现,并且对器件性能产生重大影响。线程位错在外延层中仍然很普遍,但是我们对它们对设备的影响的了解还不完整。而且,我们对缺陷微结构,电子结构以及由此对器件性能的影响之间的关系的描述不足。本文的目的是研究在当前外延层中发现的主要扩展缺陷对器件性能的影响,并表征其微观结构和电子结构,以了解它们在器件中的行为。研究了具有单个位错的雪崩光电二极管的击穿特性。与没有扩展缺陷的二极管相比,在出现过早击穿和泄漏电流增加的二极管中,发现了螺丝和边缘错位。研究了已知的泄漏机理,探讨了其解释由螺纹位错引起的泄漏电流的可行性。通过电子全息技术研究了螺纹位错位错核心处的电子结构和螺钉位错。发现n型样品中的螺纹位错带负电,这表明在核心处存在带隙阱。对来自具有不同掺杂密度的外延层的多个位错进行全息测量。基于这些测量结果,并使用紧密分布的陷阱模型,估计了陷阱密度及其电离能。;在电子束感应电流技术下研究了边缘位错电子结构。使用在带隙中形成单个能级的磁阱的模型解释了电荷收集效率的对比随掺杂密度和温度的变化。研究了在结势垒肖特基二极管的击穿和泄漏特性上存在三角形缺陷的情况,并被发现对设备特别有害。确定了三角形缺陷的微观结构,并将其与二极管的击穿和泄漏行为相关联。

著录项

  • 作者

    Berechman, Ronen Assaf.;

  • 作者单位

    Carnegie Mellon University.;

  • 授予单位 Carnegie Mellon University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2011
  • 页码 119 p.
  • 总页数 119
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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