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Investigation of device performance limiting defects in silicon carbide semiconductor.

机译:研究碳化硅半导体中限制器件性能的缺陷。

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摘要

The presence of various crystallographic defects in commercially available material limits the wide commercialization of SiC devices. These defects are known to significantly affect device characteristics such as leakage current, breakdown voltage and forward voltage. Hence the identification and investigation of defects influencing device performance is of vital importance.; This dissertation is devoted to investigation and identification of crystallographic defects in SiC bipolar and unipolar devices. Special attention is paid to studying of crystallographic defects in bipolar diodes formed by epitaxial process and diffusion. The Electron Beam Induced Current (EBIC) mode of Scanning Electron Microscope in accompaniment with other methods of defect investigation was used as the major tool for identification and analysis of the electrical activity of crystallographic defects. Their impact on the current-voltage characteristics of bipolar and unipolar devices will be discussed. Results presented in this dissertation give the possibility to provide recommendations for the identification of defects in these devices.; In the first chapter, an introduction to the material properties of SiC is given. Also the basic techniques of bulk and epitaxial growth of this material are briefly described. The second chapter includes the discussion about basic principles of dislocation theory and further description of major types of defects in SiC as well as reasons for their generation. Special attention in this chapter will be paid to description of such specific defects as Stacking Faults and partial dislocations. The issues related to the interaction of impurities with extended defects also are considered. Chapter three mainly concerns the electrical properties of crystallographic defects. Particularly, electronic properties (obtained from theory and experiment) of "clean" and "contaminated by impurities" stacking faults and C- and Si-core basal dislocations in SiC are discussed in detail. Electronic properties of threading dislocations (screw and edge type) are also discussed. Mechanism of recombination enhanced reactions in SIC is described. In the fourth chapter a review of basic techniques of investigation of crystallographic defects in SiC is presented. In the fifth chapter the principles of Electron Beam Induced Current technique are defined in detail. Particularly, interaction of electrons with material as well electron beam induced signal on defect and defect free material are described. Chapter six presents experimental results of investigation of crystallographic defects in unipolar and bipolar structures. Mechanisms of leakage current in these structures and correlation with specific defects in SiC are discussed in the next chapter, where our experimental results regarding the impact of specific defects on leakage current for diffused p-i-n junctions also are shown. Finally, in the concluding chapter, the key aspects relevant to defect investigation in SiC, developed in this dissertation, are summarized. Suggestions for future research are provided.
机译:市售材料中各种晶体缺陷的存在限制了SiC器件的广泛商业化。已知这些缺陷会严重影响器件特性,例如漏电流,击穿电压和正向电压。因此,识别和调查影响器件性能的缺陷至关重要。本论文致力于SiC双极和单极器件中晶体缺陷的研究和鉴定。特别注意研究由外延工艺和扩散形成的双极型二极管的晶体学缺陷。扫描电子显微镜的电子束感应电流(EBIC)模式以及其他缺陷研究方法,被用作鉴定和分析晶体缺陷电活性的主要工具。将讨论它们对双极性和单极性器件电流-电压特性的影响。本文提出的结果为为这些设备中的缺陷识别提供建议。在第一章中,对SiC的材料性能进行了介绍。还简要介绍了该材料的本体和外延生长的基本技术。第二章讨论了位错理论的基本原理,并进一步描述了SiC中主要缺陷类型及其产生的原因。本章将特别注意堆叠缺陷和部分位错等特定缺陷的描述。还考虑了与杂质与扩展缺陷之间的相互作用有关的问题。第三章主要涉及晶体缺陷的电学性质。特别地,详细讨论了SiC中“干净”和“被杂质污染”的堆积缺陷以及C和Si核基位错的电子性质(从理论和实验中获得)。还讨论了螺纹错位的电子特性(螺钉和刃型)。描述了SIC中重组增强反应的机理。在第四章中,介绍了研究SiC中晶体缺陷的基本技术。在第五章中,详细定义了电子束感应电流技术的原理。特别地,描述了电子与材料以及在缺陷和无缺陷材料上的电子束感应信号的相互作用。第六章介绍了研究单极和双极结构中晶体缺陷的实验结果。在下一章中将讨论这些结构中的泄漏电流的机理以及与SiC中特定缺陷的关系,我们还将展示关于特定缺陷对扩散的p-i-n结的泄漏影响的实验结果。最后,在最后一章中,总结了本文开发的与SiC缺陷研究有关的关键方面。提供了未来研究的建议。

著录项

  • 作者

    Maximenko, Serguei.;

  • 作者单位

    University of South Carolina.;

  • 授予单位 University of South Carolina.;
  • 学科 Engineering Electronics and Electrical.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 238 p.
  • 总页数 238
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;工程材料学;
  • 关键词

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