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Effects of impurities on deuterium retention in single crystal tungsten.

机译:杂质对单晶钨中氘保留的影响。

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摘要

The role of impurities in the retention of deuterium in single crystal tungsten implanted at room temperature has been investigated. To avoid the effects of air exposure, the D+ implantation and the subsequent D retention measurement using thermal desorption spectroscopy were performed in the same vacuum system without breaking vacuum. For fluences of 1 x 1023 D/m2 prominent desorption peaks were observed during TDS, one at ∼400 K and one at ∼600 K. The use of liquid nitrogen cooling of the ion beam aperture led to a reduction of the background gas impurities (O and C containing molecules) in the vacuum chamber, which consequently almost completely eliminated the post-irradiation TDS peak at ∼400 K. Reduction of these gas impurities by ∼50% has led to a reduction of ∼20% in the total deuterium retention. Furthermore, weakly bound deuterium in the W specimens was released when the vacuum system was mildly baked to ∼360 K before TDS, resulting in an approximately 50% reduction in the total amount of retained D. It was also found that post-implantation time delay before performing TDS leads to a significant loss of the implanted deuterium; ∼25% of the implanted deuterium escapes from the W specimens during the first 24 hours and ∼55% after about eight weeks.
机译:研究了在室温下注入的单晶钨中杂质在氘的保留中的作用。为了避免空气暴露的影响,在同一真空系统中进行D +注入和随后的使用热脱附光谱法进行的D保留测量,均不破坏真空。对于1 x 1023 D / m2的注量,在TDS期间观察到了显着的解吸峰,一个在〜400 K处,一个在〜600 K处。使用液氮冷却离子束孔径可减少背景气体杂质(真空室中含有O和C的分子),因此几乎完全消除了约400 K处的辐照后TDS峰。将这些气体杂质减少约50%导致总氘保留量减少了约20% 。此外,当在TDS之前将真空系统温和地烘烤到〜360 K时,W样品中的弱结合氘被释放,导致保留的D总量减少了约50%。还发现了植入后的时间延迟在进行TDS之前,会导致植入的氘大量损失;在最初的24小时内,约有25%的氘从W样品中逸出,约8周后的约有55%从氘样品中逸出。

著录项

  • 作者

    Quastel, Aaron D.;

  • 作者单位

    University of Toronto (Canada).;

  • 授予单位 University of Toronto (Canada).;
  • 学科 Engineering Aerospace.
  • 学位 M.A.Sc.
  • 年度 2005
  • 页码 79 p.
  • 总页数 79
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 航空、航天技术的研究与探索;
  • 关键词

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