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High-performance low-power carbon nanotube FET SRAM with tolerance to metallic CNTS.

机译:高性能低功耗碳纳米管FET SRAM,具有对金属CNTS的耐受性。

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摘要

In this dissertation, an in-depth study of the design of Static Random Access Memory (SRAM) cell using Carbon Nanotube (CNT) technology is presented. Due to their superior transport properties, low voltage bias and improved current density, Carbon Nanotubes have great potential to replace the conventional silicon MOSFET technology. In this study, an 8-transistor CNTFET SRAM cell shows a 3.2X speed-up, 2.9X savings in dynamic energy, and 61X leakage power reduction as compared to a MOSFET SRAM cell of similar size.;Today's CNT technology has fabrication challenges which prevent its wide use in the implementation of systems. One of these challenges is the undesirable growth of metallic CNTs with semiconducting CNTs. In this study, we present two approaches to overcome the metallic CNT challenge to achieve desirable yield for CNT transistors and SRAM cells. The first approach utilizes serially uncorrelated CNTFET to reduce the probability of non-functional transistors. The second approach requires metallic CNT removal processes and form working transistors by having parallel CNTFET array.;Among the process variations diameter/chirality greatly impacts SRAM performance, energy efficiency, noise margin and yield. Novel optimization schemes for CNTFET SRAM cell design are proposed and evaluated. Simulations show that these optimizations can effectively eliminate all cell write failures and improve the overall performance.;In addition, the SRAM cell design is examined at the near-threshold power supply region to greatly reduce energy consumption. On the other hand, Vdd reduction not only exacerbates write and read delays but also leads to more cell failure because of weakened driving capability. Gated power supply and word-line boosting techniques are investigated to overcome cell write failures in CNTFET SRAM cells. Simulation results show that with careful design methodology, the CNTFET SRAM cells are able to be operated at as low as 0.4V with 3.7X performance improvement using gated power supply and word-line boosting techniques with negligible size penalties.
机译:本文对碳纳米管技术对静态随机存取存储器的设计进行了深入的研究。由于其卓越的传输性能,低电压偏置和改进的电流密度,碳纳米管具有巨大的潜力来取代传统的硅MOSFET技术。在这项研究中,与具有类似尺寸的MOSFET SRAM单元相比,一个8晶体管CNTFET SRAM单元显示出3.2倍的速度提高,2.9倍的动态能量节省和61倍的泄漏功率降低。;当今的CNT技术面临制造挑战阻止其在系统的实现中广泛使用。这些挑战之一是金属碳纳米管与半导体碳纳米管的不良增长。在这项研究中,我们提出了两种克服金属CNT挑战的方法,以实现CNT晶体管和SRAM单元的理想产量。第一种方法利用串行不相关的CNTFET来降低出现故障的晶体管的可能性。第二种方法需要金属CNT去除工艺并通过具有平行的CNTFET阵列来形成工作晶体管。在工艺变化中,直径/手性极大地影响SRAM性能,能效,噪声容限和良率。提出并评估了用于CNTFET SRAM单元设计的新型优化方案。仿真表明,这些优化可以有效地消除所有单元写入故障并改善整体性能。此外,在接近阈值电源区域检查SRAM单元设计,以大大降低能耗。另一方面,Vdd的降低不仅加剧了写入和读取延迟,而且由于驱动能力减弱而导致更多的单元故障。为了克服CNTFET SRAM单元中的单元写入故障,研究了门控电源和字线升压技术。仿真结果表明,通过精心设计的方法,采用栅极电源和字线升压技术,尺寸可以忽略不计,CNTFET SRAM单元能够以低至0.4V的电压运行,性能提高了3.7倍。

著录项

  • 作者

    Zhang, Zhe.;

  • 作者单位

    Washington State University.;

  • 授予单位 Washington State University.;
  • 学科 Engineering Computer.;Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 145 p.
  • 总页数 145
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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