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An experimental investigation of hot switching contact damage in rf mems switches.

机译:射频内存开关中热开关触点损坏的实验研究。

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摘要

RF MEMS switches have been shown to have better performance than their solid state counterparts on account of their low insertion loss and high isolation. Despite their superiority, these switches suffer from several reliability issues which limit their lifetime when compared with p-i-n diodes and GaAs FET switches. One of the major reliability issues is the reduction in lifetime of these switches when switched under hot switching conditions i.e. when a DC voltage or RF signal is applied across the contact while it is switching from an off to on position or vice versa. In this work, contact damage in Ruthenium-on-Ruthenium microcontacts has been investigated under hot switching conditions. Using an AFM based test setup, developed at Northeastern University for the purpose of contact testing, a large number of experiments were performed to observe and understand the mechanisms that lead to microcontact damage and ultimately its failure. The structure used was a clamped-clamped beam structure with a contact bump at its center. A flat topped mating pillar formed the other end of the contact and this pillar was mounted on a piezoactuator whose expansion and contraction, leading to contacts closing and opening, replicated switching cycles. It was observed that material transfer was the primary cause for contact failure in DC hot switching. When the applied hot switching voltage exceeded 2.5 V, the direction of material transfer appeared to be polarity dependent and is always found to be from the anode to the cathode. This gives rise to the formation of a pit at the anode and a mound on the cathode. Prolonged material transfer leads to contact erosion until at one point the contact resistance becomes too high leading to contact failure. It was determined, through models and experiments, that the mechanisms leading to contact erosion operate when the electrodes are separated by either a few A or are barely touching. For leading edge hot switching, i.e. hot switching during the make phase of the contact, the damage mechanism was found to be associated with very low current and was prominent even when a current limiting resistance up to 1 MegO was placed in series with the contact. For both leading and trailing edge hot switching, when a hot switching voltage of 3.5 V is applied and a 50 O resistance is placed in series, the amounts of material transfer observed at a cycling frequency of 500 Hz were found to be almost identical. However, leading and trailing edge hot switching were also found to be different under other conditions such as when a high external resistance of 5 kO is placed in series. Also, for trailing edge hot switching, when contacts are separated extremely slowly, two different mechanisms - one polarity dependent and one polarity independent - were found to exist. These mechanisms were found to operate before the contacts fully come apart, probably when a molten metal bridge is formed between them. By examining microcontacts under a variety of hot switching conditions, ranging from different voltages, different polarities and different approach and separation rates, it was concluded that hot switching damage is an extremely complex phenomenon for microcontacts. It consists of a number of different mechanisms all occurring simultaneously in different degrees depending on the exact hot switching conditions. Even a small hot switching voltage of 0.25 V can cause damage that is significant when compared with pure cold switching i.e. when a voltage is applied only when the contact is fully closed. However, hot switching also gave rise to lower contact resistance compared with cold switching. Under bipolar hot switching, microcontacts were able to last up to more than 100 million cycles while still maintaining a contact resistance of less than 1.
机译:由于其低的插入损耗和高的隔离度,RF MEMS开关的性能优于固态开关。尽管具有优势,但与p-i-n二极管和GaAs FET开关相比,这些开关仍存在一些可靠性问题,这些问题限制了其寿命。可靠性的主要问题之一是,在热切换条件下(即,当从断开位置切换到接通位置时,在触点上施加直流电压或射频信号时,反之亦然)时,这些开关的使用寿命会缩短。在这项工作中,已经研究了热切换条件下钌上钌微触点的接触损伤。使用东北大学为接触测试目的而开发的基于AFM的测试装置,进行了大量实验以观察和了解导致微接触破坏并最终导致其失效的机制。所使用的结构是在其中心具有接触凸点的夹紧梁结构。触头的另一端形成了一个平顶的配套柱,该柱安装在一个压电执行器上,其膨胀和收缩导致触头闭合和断开,重复开关周期。据观察,材料转移是直流热切换中接触失败的主要原因。当施加的热开关电压超过2.5 V时,材料转移的方向似乎与极性有关,并且总是从阳极到阴极。这导致在阳极处形成凹坑而在阴极处形成凹坑。长时间的材料转移会导致接触腐蚀,直到某一时刻接触电阻变得太高而导致接触失败。通过模型和实验确定,当电极被几个A隔开或几乎不接触时,导致接触腐蚀的机理起作用。对于前沿的热切换,即在接触的接通阶段进行热切换,发现损坏机制与非常低的电流相关联,即使将高达1 MegO的限流电阻串联放置在该触点上也很明显。对于前沿和后沿热切换,当施加3.5 V的热切换电压并将50 O电阻串联时,发现在500 Hz的循环频率下观察到的材料转移量几乎相同。但是,在其他条件下(例如串联放置5 kO的高外部电阻时),前沿和后沿热切换也有所不同。同样,对于后沿热切换,当触点分离得非常缓慢时,发现存在两种不同的机制-一种取决于极性,另一种取决于极性。发现这些机构在触点完全分离之前就可以工作,可能是在它们之间形成了熔融金属桥时。通过检查各种热开关条件下的微接触,这些热开关的范围从不同的电压,不同的极性以及不同的接近方式和分离率,得出的结论是,热开关损坏对于微接触而言是极为复杂的现象。它由许多不同的机制组成,这些机制根据确切的热切换条件而同时在不同程度上同时发生。即使是0.25 V的很小的热开关电压也可能造成损坏,与纯冷开关相比,即仅在触点完全闭合时才施加电压时,这种损坏是很明显的。然而,与冷切换相比,热切换还导致较低的接触电阻。在双极热切换条件下,微接触能够持续超过1亿个循环,同时仍保持小于1的接触电阻。

著录项

  • 作者

    Basu, Anirban.;

  • 作者单位

    Northeastern University.;

  • 授予单位 Northeastern University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 138 p.
  • 总页数 138
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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