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Epitaxial regrowth based fabrication process for vertical cavity lasers.

机译:基于外延再生长的垂直腔激光器的制造工艺。

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摘要

GaAs based oxide confined vertical-cavity surface-emitting lasers (VCSELs) have demonstrated record performance in terms of low threshold current, high modulation speed and high wall-plug efficiency. However, oxide-confined VCSELs have reliability and non-uniformity problems that limit scaling to small active volumes for single mode operation or to micro-cavity dimensions for quantum light sources. The optical mode is also difficult to engineer since aperture geometries are limited. These limitations call for the development of a new technology that provides full control of modal overlap with optical gain, and this requires patterning of the VCSEL's transverse mode- and current-confinement. A new approach presented in this dissertation demonstrates a very important attribute in providing lithographically defined and self-aligned mode- and current-confinement suitable for arbitrary patterning and size scaling, and for high reliability, is based on an all-epitaxial device. The fabrication process involves epitaxial regrowth over shallow mesas to incorporate these intra-cavity patterns that have direct overlap with the optical mode. These intracavity gratings are defined by lithography and a selective etching process after the first stage of epitaxial growth. In this work, a VCSEL with an intracavity grating has been realized that shows an increase in the slope efficiency due to better matching of the gain and optical mode in comparison to a device that lacks the grating. Using a similar regrowth process, a laser diode incorporating a buried high index contrast GaAs-air (etched void) photonic pattern within the cavity has also been demonstrated.; Epitaxial quantum dots (QDs) present new opportunities in semiconductor light sources due to their charge localization and modified electronic density of states. It is especially interesting to combine QDs with a microcavity VCSEL, since electronic and photonic confinement become scalable in a device that can have important commercial applications. This has been achieved in a buried heterostructure VCSEL that employs an intracavity mesa to confine the quantum dots and optical mode to the same regions in the cavity. Cavity quality factors as high as 33000 are measured, and ground state lasing is demonstrated with a single quantum dot active layer for temperatures up to 110 K.
机译:基于GaAs的氧化物限制垂直腔表面发射激光器(VCSEL)在低阈值电流,高调制速度和高壁塞效率方面表现出优异的性能。但是,氧化物限制的VCSEL具有可靠性和不均匀性问题,这些问题将缩放比例限制为单模操作的小有效体积或量子光源的微腔尺寸。由于孔径几何形状受到限制,因此光学模式也难以设计。这些限制要求开发一种新技术,该技术可以完全控制具有光学增益的模态重叠,并且这需要对VCSEL的横向模式和电流限制进行构图。本文提出的一种新方法展示了一种非常重要的属性,它基于全外延器件,提供了光刻定义和自对准的模式和电流限制,适用于任意图案化和尺寸缩放,并且具有很高的可靠性。制造过程包括在浅台面上方外延长生,以合并这些腔内图案,这些图案与光学模式直接重叠。在第一外延生长阶段之后,通过光刻和选择性蚀刻工艺来定义这些腔内光栅。在这项工作中,已经实现了具有腔内光栅的VCSEL,与没有光栅的器件相比,由于增益和光学模式的更好匹配,斜率效率有所提高。使用类似的再生过程,也已经证明了在腔体内结合有掩埋的高折射率对比度GaAs-空气(蚀刻空隙)光子图案的激光二极管。外延量子点(QD)由于其电荷定位和改进的态电子密度而在半导体光源中提供了新的机会。将QD与微腔VCSEL结合起来特别有趣,因为电子和光子限制变得可以在具有重要商业应用的设备中扩展。这是通过采用腔内台面将量子点和光学模式限制在空腔中的相同区域的掩埋异质结构VCSEL中实现的。测量的腔质量因数高达33000,并通过单量子点有源层在高达110 K的温度下证明了基态激光发射。

著录项

  • 作者

    Gazula, Deepa.;

  • 作者单位

    The University of Texas at Austin.$bElectrical and Computer Engineering.;

  • 授予单位 The University of Texas at Austin.$bElectrical and Computer Engineering.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 93 p.
  • 总页数 93
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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