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Electronic and optical properties of silicon based semiconductors with reduced dimension: A theoretical study.

机译:尺寸减小的硅基半导体的电子和光学特性:理论研究。

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摘要

We have developed efficient theoretical methods to study nanoscale silicon-based semiconductor materials. The Si surface, delta-doped Si semiconductors and Si clusters are studied by Density Functional Theory with Local Density Approximation (DFT-LDA) with plane-wave, DFT-LDA with Wannier orbitals and GW approximation. First, on the Hydrogen-passivated Si surface, the migration of Si atoms is studied with FHIMD package. The result shows a special migration path along the surface dimer row. And further calculation shows that clustering is a possible mechanism for the interruption of the homoepitaxial growth of Si in low temperatures. Second, a planar Wannier orbital scheme is formulated to study phosphorus delta-doped Si. The delta-doped Si is studied at various high doping densities, ranging 1/1024 ML ∼ 1/4 ML, which is 6.6 x 1011cm-2∼1.7 x 10 14cm-2. Our result on the experimental 1/4ML doping shows that the Fermi level is 100meV below conduction band minimum, and the short range interaction effect is small. Last, an efficient GWA method is developed to study Hydrogen passivated Si clusters. The method, using basic group theory and the symmetry of the clusters, makes the GW study of nanoclusters possible. The study shows that the bright light emitted from 1-nm SiH clusters comes from the two excitations in the Si29 H24 cluster.;In this work, we have successfully studied silicon surface, phosphorus delta-doped silicon, and Hydrogen passivated silicon clusters. To study the systems efficiently, we have developed planar Wannier formula with envelope functions, and GWA formula in symmetrized plane-wave basis. The formulas are successfully applied to the studied materials. Moreover, the methods can be used to study other nano-materials.
机译:我们已经开发出有效的理论方法来研究纳米级硅基半导体材料。利用平面波的局部密度近似(DFT-LDA),Wannier轨道的DFT-LDA和GW近似,研究了硅表面,掺do硅半导体和硅团簇。首先,在氢钝化的硅表面上,用FHIMD封装研究了硅原子的迁移。结果显示了沿表面二聚体行的特殊迁移路径。进一步的计算表明,团簇是在低温下中断Si同质外延生长的可能机制。其次,制定了一个平面的Wannier轨道方案来研究掺有磷的硅。研究了在各种高掺杂密度(范围为1/1024 ML〜1/4 ML,即6.6 x 1011cm-2〜1.7 x 10 14cm-2)下掺杂了delta的Si。我们对1 / 4ML掺杂实验的结果表明,费米能级比导带最小值低100meV,并且短程相互作用效应很小。最后,开发了一种有效的GWA方法来研究氢钝化的Si团簇。该方法利用基本的群论和团簇的对称性,使得纳米团簇的GW研究成为可能。研究表明,从1-nm SiH团簇发出的亮光来自Si29 H24团簇中的两次激发。在这项工作中,我们已经成功地研究了硅表面,掺磷的硅和氢钝化的硅团簇。为了有效地研究系统,我们开发了具有包络函数的平面Wannier公式和对称波面的GWA公式。该公式已成功地应用于所研究的材料。此外,该方法可用于研究其他纳米材料。

著录项

  • 作者

    Qian, Gefei.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Physics Condensed Matter.;Biophysics General.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 110 p.
  • 总页数 110
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 生物物理学;
  • 关键词

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