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Modeling of Schottky junction transistor using Monte Carlo device simulation technique.

机译:使用蒙特卡洛器件仿真技术对肖特基结晶体管建模。

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摘要

As the semiconductor feature size reduces and enters into nanometer scale realm, modeling of device characteristics becomes tedious because new physical phenomena such as effects of quantum mechanical tunneling become more relevant at this ultra small scale. As a result limitations of traditional modeling tools like Medici, Silvaco are reached because the models are based on drift diffusion or hydrodynamic models which are based on simplified approximate solution of the Boltzmann transport equation. So to capture physical behavior appropriately of the Schottky Junction Transistor (SJT) having gate length of 0.1mum or below a physics based model Monte Carlo transport Kernel is developed. The motto of this dissertation is to develop the transport model for the SJT and projects the characteristics features of the device when the dimension goes down and to estimate the behavior in terms of figure of merits of the device.; To develop the transport model, based on the solution of the Boltzmann Transport Equation, for modeling n-channel silicon-on-insulator (SOI) MESFETs, the 2D in-house Ensemble Monte Carlo device simulator is being used. All relevant scattering mechanisms for the silicon material system have been included in the transport model. Scattering from the rough Si/SiO 2 interface is included as a real space treatment and utilizing two different but consistent methods. Major modifications in the in-house device simulator to model this particular device structure have been made in the description of the carrier flow from the gate contact to the conduction channel, which takes place mainly by tunneling through the Schottky barrier at the silicon/CoSi2 interface. For proper inclusion of the gate tunneling and thermionic emission currents we have utilized the transfer matrix approach for linearized potentials, that leads to Airy function formulation. Once the model has been developed, the performance of the SJT in terms of figure of merits cutoff frequency, voltage gain has been evaluated and verified with experimental results. Concomitantly, on the basis of performance, the optimized device structure has also been evaluated. Small signal analysis was also performed to estimate the cutoff frequency and voltage gain as well as small signal parameters of the SJT. From the observed results one can predict that due to its salient features SJT is a suitable candidate for micropower r.f. application.
机译:随着半导体特征尺寸的减小并进入纳米尺度领域,器件特性的建模变得繁琐,因为在这种超小尺度下,诸如量子力学隧穿效应等新的物理现象变得越来越重要。结果,由于模型是基于漂移扩散或流体动力学模型而建立的,因此无法获得诸如Medici,Silvaco等传统建模工具的局限,这些模型基于玻尔兹曼输运方程的简化近似解。因此,为了适当地捕获栅极长度为0.1μm或以下的肖特基结晶体管(SJT)的物理行为,开发了基于物理的模型蒙特卡洛传输内核。本文的座右铭是开发SJT的运输模型,并在尺寸减小时投影设备的特征,并根据设备的优值来估计其行为。为了基于Boltzmann输运方程的解来开发输运模型,以对n沟道绝缘体上硅(SOI)MESFET建模,正在使用2D内部Ensemble蒙特卡洛器件仿真器。硅材料系统的所有相关散射机制已包含在运输模型中。从粗糙的Si / SiO 2界面散射是一种真实的空间处理方法,它利用了两种不同但一致的方法。在内部设备模拟器中进行了重大修改,以对这种特定的设备结构进行建模,在描述从栅极触点到传导通道的载流时,主要是通过隧穿硅/ CoSi2界面处的肖特基势垒进行的。为了适当地包括栅极隧穿和热电子发射电流,我们利用转移矩阵方法来线性化电势,这导致了艾里函数的形成。一旦建立了模型,就可以根据品质因数截止频率,电压增益来评估SJT的性能,并通过实验结果进行了验证。同时,基于性能,还对优化的器件结构进行了评估。还进行了小信号分析,以估算SJT的截止频率和电压增益以及小信号参数。从观察到的结果可以预测,由于其显着特征,SJT是微功率射频的合适候选者。应用。

著录项

  • 作者

    Tarik, Khan Abdulla.;

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 111 p.
  • 总页数 111
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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