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Carbon nanotube devices: Growth, imaging, and electronic properties.

机译:碳纳米管器件:生长,成像和电子特性。

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摘要

This dissertation focuses on growth, fabrication, and electronic characterization of carbon nanotube (CNT) devices. A technique for imaging CNTs on insulating substrates with the scanning electron microscope (SEM) will be described. This technique relies on differential charging of the CNT relative to the surrounding insulator. In addition, it is not only quicker than using scanning probe microscopy (SPM), but is also useful for identifying conducting pathways within an assortment of CNTs and metallic contacts.; CNT field effect transistors (FETs) fabricated on strontium titanate gate dielectric show transconductances normalized by channel width of 8900 S/m, greatly exceeding that in Si FETs. Intriguingly, the transconductance cannot be explained within the conventional FET or Schottky-barrier models. To explain this, it is proposed that there is Schottky-barrier lowering due to high electric fields at the CNT/contact interface.; Exploring novel CNT-FET lithography, I demonstrate focused electron beam induced deposition (FEBID) of pure gold for CNT device electrodes. In examination of the CNT/electrode interface, equivalence between FEBID leads and leads deposited using conventional electron beam lithography is found with the majority device resistance in the CNT.; Lastly, CNTs are suspended across wide trenches (>100mum). These trenches are formed without lithography or etching and have metallic leads on either side of the trench for electrical transport measurements. Using a mechanical probe as a mobile gate, electrical transport can be performed on these suspended CNT devices, which show minimal hysteresis consistent with the absence of charge trapping.
机译:本文主要研究碳纳米管(CNT)器件的生长,制造和电子表征。将描述通过扫描电子显微镜(SEM)使绝缘基板上的CNT成像的技术。该技术依赖于CNT相对于周围绝缘体的差分充电。此外,它不仅比使用扫描探针显微镜(SPM)更快,而且对于识别各种CNT和金属触点中的导电路径也很有用。在钛酸锶栅极电介质上制造的CNT场效应晶体管(FET)显示出的跨导归一化为8900 S / m的沟道宽度,大大超过了Si FET中的跨导。有趣的是,无法在常规FET或肖特基势垒模型中解释跨导。为了解释这一点,建议在CNT /接触界面处由于高电场而降低肖特基势垒。探索新颖的CNT-FET光刻技术,我演示了用于CNT器件电极的纯金的聚焦电子束诱导沉积(FEBID)。在检查CNT /电极界面时,发现FEBID引线和使用常规电子束光刻沉积的引线之间的等效性是CNT中的大多数器件电阻。最后,CNT悬在宽沟槽(> 100mum)上。形成这些沟槽时无需进行光刻或蚀刻,并且在沟槽的两侧均具有金属引线以进行电传输测量。使用机械探针作为移动门,可以在这些悬浮的CNT器件上执行电传输,这些器件显示出最小的磁滞现象,与不存在电荷俘获相一致。

著录项

  • 作者

    Brintlinger, Todd Harold.;

  • 作者单位

    University of Maryland, College Park.;

  • 授予单位 University of Maryland, College Park.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 139 p.
  • 总页数 139
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;无线电电子学、电信技术;
  • 关键词

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