Hydrogen chloride purification, reducing moisture to obtain higher quality epitaxial film deposition.

摘要

Hydrogen chloride is a gas used in the manufacturing of semiconductors. It is common for moisture to be found as a contaminant in hydrogen chloride. The presence of moisture in the hydrogen chloride gas can cause adverse effects in the semiconductor manufacturing process.; This project provides an overview of the problems that result from poor quality hydrogen chloride. It explores available methods for purifying hydrogen chloride at the source of the gas use. One new purification method is demonstrated and the benefits are shown.; This project results in a methodology for testing hydrogen chloride for moisture without necessitating the use of expensive moisture analyzer equipment being plumbed to a manufacturing tool.