首页> 外文会议>World Tribology Congress III 2005 vol.2 >SINGLE ASPERITY ATOMIC FORCE MICROSCOPE STUDIES OF THE CMP OF SILICATE GLASSES
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SINGLE ASPERITY ATOMIC FORCE MICROSCOPE STUDIES OF THE CMP OF SILICATE GLASSES

机译:硅酸盐玻璃CMP的单原子原子力显微镜研究

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The Atomic Force Microscope (APM) allows one to examine the effects of applying highly localized stress to a surface. In the presence of solutions, tribochemical wear can be investigated. We present results of fundamental studies of the simultaneous application of chemical agents and mechanical stress involving a model single asperity and a solid surface. We show the consequences of combining highly localized mechanical stress (due to contact with the AFM tip) and exposure to aqueous solutions of known pH. The experiment simulates many features of a single particle-substrate-slurry interaction in CMP. We show that linear scans and rastered scans display significantly different material removal rates. Quantitative models are presented to explain the observed nanometer-scale surface modifications. This work complements recent observations of tip-induced wear and growth in a number of inorganic surfaces in aqueous solution.
机译:原子力显微镜(APM)可以检查对表面施加高度局部应力的效果。在溶液存在的情况下,可以研究摩擦化学磨损。我们提出了同时使用化学剂和机械应力的基础研究的结果,其中涉及模型单个粗糙和固体表面。我们展示了将高度局部的机械应力(由于与AFM尖端接触)和暴露于已知pH的水溶液相结合的结果。该实验模拟了CMP中单个颗粒-基质-浆液相互作用的许多特征。我们显示线性扫描和光栅扫描显示出明显不同的材料去除率。介绍了定量模型以解释观察到的纳米级表面改性。这项工作是对尖端观察到的在水溶液中许多无机表面中磨损和生长的最新观察结果的补充。

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