Thermally Stable Molybdenum Oxide Hole-Selective Contacts Deposited using Spatial Atomic Layer Deposition

摘要

deposited using spatial atomic layer deposition. We show that the use of the high work function (5.01 eV) Nickel, as a replacement to the Aluminum contact, not only assists in efficient hole-transport, but also forms a thermally stable contact up to temperatures of 300°C with contact resistivities below 10 mΩ-cm