首页> 外文会议>Twenty-Eighth International Symposium on Compound Semiconductors Oct 1-4, 2001 Tokyo, Japan >Molecular Orbital Study of Electronic States by Discrete Variational Xα method: Influences of Chalcogen Atoms
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Molecular Orbital Study of Electronic States by Discrete Variational Xα method: Influences of Chalcogen Atoms

机译:离散变分Xα方法研究电子态的分子轨道:硫族元素原子的影响

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摘要

Electronic states of InP (100) surface were studied by using small size clusters and discrete variational Xα method. A bare surface with In at the top layer has a high density of the surface states in the middle of the forbidden band, while that with P at the top layer does not have surface states in the forbidden band. Adsorption sites of chalcogen atoms on the (100) InP surfaces were determined by studying minimum total energy. Chalcogen atoms adsorption at the In-top surface reduces, while that at the P-top surface increases, the surface state densities in the forbidden band.
机译:通过使用小尺寸簇和离散变分Xα方法研究了InP(100)表面的电子状态。顶层带有In的裸露表面在禁带的中间具有高密度的表面态,而顶层带有P的裸露表面在禁带中没有表面态的密度。通过研究最小总能量来确定(100)InP表面上硫族元素原子的吸附位置。硫属元素在In上表面的吸附减少,而在P上表面的吸附增加,禁带中的表面态密度。

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