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Filtering Shields in Vacuum-Arc Plasma Sources

机译:真空电弧等离子体源中的屏蔽层

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摘要

The applicability of a labyrinth system of intercepting shields for suppressing macroparticle flows in the plasma of vacuum-arc sources with a magnetic focusing was investigated. Two variants of the source acceptable for using the metal cathode and the graphite cathode are described. Being advantageously distinguished from all other similar-purpose devices by the simplicity in the design, the plasma sources with the filtering shields under study are approximately equivalent in their capacity and in the coating roughness to the filter with the "magnetic isle", and also to the pulsed source with laser ignition.
机译:研究了迷宫式拦截屏蔽系统在磁聚焦下抑制真空电弧源等离子体中的大颗粒流的适用性。描述了对于使用金属阴极和石墨阴极可接受的源的两个变体。与其他所有类似用途的设备相比,其设计上的简便性使其与众不同,具有研究中的过滤罩的等离子体源的容量和涂层粗糙度与带有“电磁岛”的过滤器大致相等,并且与带有激光点火的脉冲源。

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