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Deposition of Cr, Al coatings on Ni by means of a PB and FB CVD process

机译:通过PB和FB CVD工艺在Ni上沉积Cr,Al涂层

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摘要

The present work concerns the formation of chromium and/or aluminide diffusion coatings on nickel, by means of a pack and fluidised bed chemical vapour deposition (PBCVD and FBCVD) process. The object to be treated is suspended within the reactor, which contains the treating agent. The latter is a mixture of powders of the donor of the coating-forming element (Al, Cr, Al-Cr) and of a filler material (Al_2O_3). As an activator of the process, a halide compound is used (NaCl, NH_4Cl, NaCl + NH_4Cl, HCl) in an inert atmosphere (Ar). The precursor vapours of the element to be deposited are formed in situ, by the reaction of the donor with the activator and react with the substrate surface for the formation of the coatings. The produced coatings are characterised by optical microscopy and SEM techniques (EDS) , in order to obtain their surface composition, the coating thickness and quality and the aluminium and chromium distribution along the coating-substrate interface. The formation of Al-Cr diffusion coatings was achieved in a short time PB and FB process, accompanied by a clearly visible diffusion zone.
机译:本工作涉及通过填充和流化床化学气相沉积(PBCVD和FBCVD)工艺在镍上形成铬和/或铝化物扩散涂层。将要处理的物体悬浮在含有处理剂的反应器内。后者是涂层形成元素的给体(Al,Cr,Al-Cr)和填充材料(Al_2O_3)的粉末混合物。作为该方法的活化剂,在惰性气氛(Ar)中使用卤化物(NaCl,NH_4Cl,NaCl + NH_4Cl,HCl)。通过供体与活化剂的反应,原位形成待沉积元素的前体蒸气,并与基材表面反应形成涂层。通过光学显微镜和SEM技术(EDS)对所产生的涂层进行表征,以获得其表面组成,涂层厚度和质量以及沿涂层-基材界面的铝和铬分布。 Al-Cr扩散涂层的形成是在短时间的PB和FB过程中完成的,伴随着清晰可见的扩散区。

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