首页> 外文会议>The Third International Symposium on Electronic Packaging Technology August 17-21, 1998 Beijing, China >Electroless plating of nickel-tungsten-phosphorus alloy for hybrid circuit packaging
【24h】

Electroless plating of nickel-tungsten-phosphorus alloy for hybrid circuit packaging

机译:用于混合电路封装的镍钨磷合金的化学镀

获取原文
获取原文并翻译 | 示例

摘要

The electroless plating process of nickel-tungsten-jphosphorus (Ni-W-P) alloy applied in thin film resistor making is described in the paper. Some factors, such as the bath composition, operating conditions(e.g., temperature, plating time and pH value), especially the effects of additives on the Ni-W-P thin film resistor are also discussed. It has been proved that adding a small amount of earth elements to the bath not only increased corrosion resistance of the deposit, but also improved the stability of thin film resistor. The results of heat-treatment and aging test showed that the atmosphere has obvious influences on the thin film resistor; after annealing in elevated temperature (above 250 deg C) in the air, the resistance increases rapidly, which mainly attributed to the oxidation of Ni-W-P film; and after annealing in 400 deg C under technical pure N_2 or H_2 atmosphere for 15 mins, there are no obvious changes for the resistance. The data of the aging test in 150 deg C in the air demonstrated the good resistance stability of the Ni-W-P film.
机译:本文介绍了用于薄膜电阻器制造的镍钨j磷(Ni-W-P)合金的化学镀工艺。还讨论了一些因素,例如镀液组成,操作条件(例如温度,电镀时间和pH值),尤其是添加剂对Ni-W-P薄膜电阻器的影响。业已证明,向镀液中添加少量的土质元素不仅可以提高镀层的耐腐蚀性,而且可以提高薄膜电阻器的稳定性。热处理和老化试验的结果表明,气氛对薄膜电阻有明显的影响。在空气中(高于250摄氏度)高温退火后,电阻迅速增加,这主要归因于Ni-W-P膜的氧化。在纯N_2或H_2气氛下在400℃退火15分钟后,电阻无明显变化。空气中150摄氏度的老化测试数据表明,Ni-W-P膜具有良好的电阻稳定性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号