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Luminescent properties of GaN thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备的GaN薄膜的发光特性

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摘要

The luminescent properties of GaN thin films grown by pulsed laser deposition have been studied to understand the nature of the luminescent centres and the recombination dynamics. The films were grown on heated sapphire substrates using KrF excimer laser ablation of GaN in a reactive atmosphere of nitrogen. At low temperature the continuous wave (CW) blue luminescence of the samples grown shows two sharp lines attributed to excitonic recombination localized at extended defects. An analysis of the temperature dependence of photoluminescence (PL) lifetimes assesses the relative contributions of radiative and non-radiative recombination in the centres responsible for these emissions. The measurement of room temperature nanosecond radiative lifetimes for these lines supports the excitonic attribution of the luminescence.
机译:已经研究了通过脉冲激光沉积生长的GaN薄膜的发光特性,以了解发光中心的性质和重组动力学。在氮气的反应性气氛中,使用KrF准分子激光烧蚀GaN,在加热的蓝宝石衬底上生长薄膜。在低温下,所生长样品的连续波(CW)蓝色发光显示出两条清晰的线,这是由于激子复合位于局部缺陷处而引起的。对光致发光(PL)寿命的温度依赖性的分析评估了负责这些排放的中心中辐射和非辐射复合的相对贡献。这些线的室温纳秒辐射寿命的测量结果支持了发光的激子归因。

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