Development of In-Situ Surface Observation System with an Atomic Resolution under Tensile Stress by Atomic Force Microscope

摘要

A new in-situ surface observation system under tensile stress with an atomic resolution has been developed for the purpose of the explanation of the deformation of the surface and the crack growth mechanism for thin films in the micro- and nano-mechanical systems. The mechanical properties such as Young's modulus can be determined at the same time. This observation system consists of the on-chip tensile testing system and a commercialized atomic force microscope (AFM). The on-chip testing system is characterized by a static loading mechanism with a flat spring and a test chip of single-crystal silicon of 15 x 15 x 0.5 mm. Particular attention has been paid to the suppression of the vibration which effects on images of the surface with an atomic resolution. Atomic images of the surface of mica can be observed under various tensile strains till the occurrence of the fracture. The growth of the cracks and Young's modulus for TiN thin film deposited on silicon (100) specimen can be also clarified.