Combined spectroscopic ellipsometry and ion beam surface analysis for in-situ real-time characterization of complex oxide film growth

摘要

In-situ real time characterization of chemically and structurally complex thin films is becoming important as complex materials are finding more applications in electronic devices. To this end, a unique thin film growth and deposition system was constructed combining a multi-target sputter deposition system with spectroscopic ellipsometry and time-of-flight ion scattering and recoil spectroscopy. This system is demonstrated with studies on YBa_2Cu_3O_(7- delta ) and BaSrTiO_3 films.