首页> 外文会议>Symposium Proceedings vol.865; Symposium on Thin-Film Compound Semiconductor Photovoltaics; 20050329-0401; San Francisco,CA(US) >Electron Radiation Damage in Cu(In,Ga)Se_2 Analysed In-situ by Cathodoluminescence in a Transmission Electron Microscope
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Electron Radiation Damage in Cu(In,Ga)Se_2 Analysed In-situ by Cathodoluminescence in a Transmission Electron Microscope

机译:透射电子显微镜中阴极发光原位分析Cu(In,Ga)Se_2中的电子辐射损伤

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摘要

We have equipped our transmission electron microscope (accelerating voltage up to 300 kV) with a cathodoluminescence (CL) system that covers a wavelength range of 180 - 1800 nm and temperatures from 10 K upwards. This contribution shows how this system can be utilized to study the initial damage process due to electron irradiation in Cu(In,Ga)Se_2 thin solar films. This damage leads essentially to atomic defects that cannot structurally be imaged in the transmission electron microscope, but influence the luminescence spectra. We analyse in-situ the spectral evolutions with electron dose of Cu(In_(1-x)Ga_x)Se_2 with [Ga]/([Ga]+[In]) ratio x ranging from x=0 to x=1 and interpret the defect formation kinetics with a first model. The obtained results indicate that the films with equal Ga and In concentration are the least radiation sensitive. The voltage dependence of the damage rate indicates that the damage arises essentially due to displacement by electron knock-on (in the voltage range 150 - 300 kV).
机译:我们已经为透射电子显微镜(最高电压达到300 kV)配备了阴极发光(CL)系统,该系统涵盖180至1800 nm的波长范围和10 K以上的温度。该贡献显示了如何利用该系统研究由于Cu(In,Ga)Se_2太阳能薄膜中的电子辐照引起的初始损伤过程。这种损坏本质上导致原子缺陷,该原子缺陷在结构上无法在透射电子显微镜中成像,但会影响发光光谱。我们以[Ga] /([Ga] + [In])比x在x = 0到x = 1的范围内对Cu(In_(1-x)Ga_x)Se_2电子剂量的光谱演化进行原位分析,并解释第一个模型的缺陷形成动力学。获得的结果表明,Ga和In浓度相等的薄膜对辐射的敏感性最低。损坏率与电压的关系表明,损坏主要是由于电子撞击(在150-300 kV电压范围内)引起的位移引起的。

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