首页> 外文会议>Symposium Proceedings vol.837; Symposium on Materials for Hydrogen Storage; 20041201-02; Boston,MA(US) >Nano-Columnar Mg Thin Films Created by Plasma Sputter Deposition for Improved Hydrogen Kinetics and Storage Properties
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Nano-Columnar Mg Thin Films Created by Plasma Sputter Deposition for Improved Hydrogen Kinetics and Storage Properties

机译:通过等离子溅射沉积制备的纳米柱状镁薄膜,可改善氢动力学和存储性能

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摘要

The hydrogen storage properties of nanostructured Mg and MgH_2 thin films were studied as created by Ar and Ar+H_2 plasma sputter deposition. Columnar structures with typical widths of ~120 nm are observed with their long columnar axis extending throughout the thickness of the films. Applying substrate bias voltages during deposition results in narrower columns. A concomitant reduction in hydrogen desorption temperature from 400℃ to 360℃ is observed. Capping the Mg films with a ~100 nm thin Pd layer leads to significantly reduced hydrogen desorption temperatures of ~200℃ induced by the catalytic activity of the Pd cap layer. Also, hydrogen permeation of the films is strongly improved. The rate-determining factor is found to be the dissociation of the hydrogen molecules. Optimum hydrogen loading conditions of the Pd/Mg films were obtained just above ~200℃ at hydrogen pressures of 0.25-1.0 MPa, resulting in hydrogen storage capacities in the range of 4-7 wt%.
机译:研究了由Ar和Ar + H_2等离子溅射沉积产生的纳米结构Mg和MgH_2薄膜的储氢性能。观察到典型的〜120 nm宽度的柱状结构,它们的长柱状轴延伸到整个膜的厚度。在沉积期间施加衬底偏置电压导致更窄的列。观察到氢解吸温度从400℃随之降低。用约100 nm的Pd薄层覆盖Mg薄膜会导致由于Pd盖层的催化活性而引起的〜200℃的氢解吸温度大大降低。而且,大大改善了膜的氢渗透。发现决定速率的因素是氢分子的解离。在氢气压力为0.25-1.0 MPa时,刚好在200℃以上获得了Pd / Mg薄膜的最佳载氢条件,储氢能力在4-7 wt%范围内。

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