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The Electrical Behavior of Pd/AlN/Semiconductor Thin Film Hydrogen Sensing Structures

机译:Pd / AlN /半导体薄膜氢感测结构的电学行为

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摘要

The device on Si substrates behaves as an MIS capacitor and the response to hydrogen is given by a shift of the capacitance vs. bias profile along the bias voltage axis, whereas the device on SiC behaves as a rectifying diode and the presence of hydrogen causes a shift of the forward current vs. voltage plot. The relatively large forward current, in both cases, indicates that there is measurable electrical transport across the AlN layer, but at the same temperature the turn on bias is different. Either structure contains two rectifying contacts in series, namely a Schottky contact between Pd and AlN and a heterojunction between AlN and the substrate.
机译:Si衬底上的器件充当MIS电容器,对氢的响应由电容与偏置曲线沿偏置电压轴的偏移给出,而SiC上的器件充当整流二极管,氢的存在导致正向电流与电压曲线的偏移。在两种情况下,相对较大的正向电流都表明在AlN层上有可测量的电传输,但是在相同温度下,导通偏置是不同的。任一结构都包含两个串联的整流接触,即Pd和AlN之间的肖特基接触以及AlN和衬底之间的异质结。

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