首页> 外文会议>Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution Oct 1999, Honolulu, Hawaii >ELECTROCRYSTALLIZATION of Cu/Co MULTILAYERS IN-SITU MASS, INTERNAL STRESS and MAGNETIZATION MEASUREMENTS
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ELECTROCRYSTALLIZATION of Cu/Co MULTILAYERS IN-SITU MASS, INTERNAL STRESS and MAGNETIZATION MEASUREMENTS

机译:Cu / Co多层膜的电结晶原位质量,内部应力和磁化强度的测量

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The electrocrystallization of Cu-Co multilayers is investigated by means of simultaneous and in-situ mass and internal stress measurements using the double quartz crystal resonator technique. The magnetization is measured in-situ, during the electrodeposition, using an electrochemical alternating gradient magnetometer and the hysteresis loops are also recorded in situ. It is shown that at the beginning of cobalt deposition hydrogen evolution is the main reaction. The internal stress increases markedly. The magnetization results show that cobalt grows first as isolated mono-domain particles. With increasing cobalt layer thickness, hydrogen evolution becomes less important, and particles grow becoming multidomain.
机译:通过使用双石英晶体谐振器技术同时进行原位质量和内部应力测量,研究了Cu-Co多层膜的电结晶。在电沉积过程中,使用电化学交变梯度磁力计就地测量磁化强度,并且还就地记录了磁滞回线。结果表明,在钴沉积开始时,析氢是主要反应。内部应力明显增加。磁化结果表明,钴首先作为孤立的单畴粒子生长。随着钴层厚度的增加,氢的释放变得不那么重要,并且颗粒逐渐变为多畴。

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