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Electrical properties of ultra thin TIN oxide films

机译:TIN薄膜的电学特性

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摘要

Tin Oxide transparent conductive oxide(TCO) films of less than 20nm in thickness was developed as a substrate for pen touch screens. The films were deposited using APCVD method by hydrolytic decomposition of stannic chloride. Electrical properties and stability to heat treatment were studied in relation to deposition conditions. We found the both properties depends mainly of fluorine concentration in the fims. The stability was much improved at reduced fluorine concentration. The film which showed the stability to heat treatment at 600 deg C heat treatment was attained at the thickness of 20nm.
机译:厚度小于20nm的氧化锡透明导电氧化物(TCO)薄膜被开发为笔触摸屏的基板。使用APCVD方法通过氯化锡的水解分解来沉积膜。研究了与沉积条件有关的电性能和对热处理的稳定性。我们发现这两种性质主要取决于膜中氟的浓度。在降低的氟浓度下,稳定性大大提高。在20nm的厚度下获得对600℃的热处理显示出热处理稳定性的膜。

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