首页> 外文会议>Symposium on Epitaxial Growth--Principles and Applications held April 5-8, 1999, San Francisco, California, U.S.A. >Transmission electron microscopy study of InGaAs/GaAs structural evolution near the stranski-krastanow transformation
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Transmission electron microscopy study of InGaAs/GaAs structural evolution near the stranski-krastanow transformation

机译:stranski-krastanow变换附近的InGaAs / GaAs结构演化的透射电子显微镜研究

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摘要

An experimental study of the microstructure during formation and evolution of MOCVD-grwon In_(0.6)Ga_(0.4)As/GaAs quantum dots (QDs) was undertaken to provide a more thorough understanding of the underlying growth principles. Transmission Electron Microscopy (TEM) was used to examine the evolution of the In_(0.6)Ga_(0.4)As/GaAs system in order to correlate photoluminescence (PL) spectra with structural data. In particular, we have examined the QD size evolution, capped and uncapped, and its possible contribution to the slight QD PL blueshift observed before QD saturation. TEM studies in the QD coalescence regime clarify the microstructural origins of the sharp decrease in QD PL due to large, incoherent islands observed in AFM and TEM images.
机译:进行了对MOCVD生长的In_(0.6)Ga_(0.4)As / GaAs量子点(QDs)形成和演化过程中的微观结构的实验研究,以提供对潜在生长原理的更彻底的理解。透射电子显微镜(TEM)用于检查In_(0.6)Ga_(0.4)As / GaAs系统的演化,以便将光致发光(PL)光谱与结构数据相关联。特别是,我们检查了QD大小变化(加帽和未加帽)及其对QD饱和之前观察到的QD PL轻微蓝移的可能贡献。在QD合并方案中进行的TEM研究澄清了由于在AFM和TEM图像中观察到的大的,不连贯的岛而导致QD PL急剧下降的微观结构起源。

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