首页> 外文会议>Symposium on Defect and Impurity Engineered Semiconductors and Devices III, Apr 1-5, 2002, San Francisco, California >Probing the Al_cGa_(1-c)N Atomic Distribution via UV-Photoluminescence and Raman at Sub-Jim Scale
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Probing the Al_cGa_(1-c)N Atomic Distribution via UV-Photoluminescence and Raman at Sub-Jim Scale

机译:通过紫外光致发光和拉曼光谱在亚吉级范围内探测Al_cGa_(1-c)N原子分布

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摘要

The spatial dependence of the band-gap light-emission energy of Al_xGa_(1-x)N alloys at composition 0 ≤ x ≤ 1 was studied via deep UV-photoluminescence (PL) and Raman microscopy. The data were acquired in a random fashion from an area of ~ 1mm~2 on the sample at steps of ~ 1 μm ― 200 μm utilizing the 244 nm laser line of probing spot size ~300 nm radius. Our study indicates that the PL emission energy exhibits random type variations depending on locality: the alloys of composition x=0.12, x=0.22, and x=0.70 exhibit variations of ~ 10 meV, 30 meV, and 25 meV respectively. The PL of the pure GaN exhibits no spatial dependence while the alloy of x=0.50 exhibits a variation around ~ 45 meV. Moreover, the functional dependence of the band-gap E_g, on the composition was found to be E_g(x)=3.4(1-x)+6.2x-1.2x(1-x) from which the compositional variation, Δx, can be computed for a given variation in the PL emission energy after accounting for the stress effect in the alloys.
机译:通过深紫外光致发光(PL)和拉曼显微镜研究了成分为0≤x≤1的Al_xGa_(1-x)N合金的带隙发光能量的空间依赖性。利用探测点尺寸〜300 nm半径的244 nm激光线,以〜1μm〜200μm的步长从样品上〜1mm〜2的区域以随机方式获取数据。我们的研究表明,PL发射能量表现出随位置而定的随机类型变化:组成x = 0.12,x = 0.22和x = 0.70的合金分别表现出〜10 meV,30 meV和25 meV的变化。纯GaN的PL不表现出空间依赖性,而x = 0.50的合金表现出约〜45 meV的变化。此外,发现带隙E_g对成分的功能依赖性为E_g(x)= 3.4(1-x)+ 6.2x-1.2x(1-x),从中可以看出成分变化Δx。在考虑到合金中的应力效应后,对于给定的PL发射能量变化,可以计算得到。

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