首页> 外文会议>State-of-the-art program on compound semiconductors 52 (SOTAPOCS 52) >'Graphene-Like' Exfoliation of Atomically-Thin Films of Bi_2Te_3 and Related Materials: Applications in Thermoelectrics and Topological Insulators
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'Graphene-Like' Exfoliation of Atomically-Thin Films of Bi_2Te_3 and Related Materials: Applications in Thermoelectrics and Topological Insulators

机译:Bi_2Te_3和相关材料的原子薄薄膜的“石墨烯样”剥离:在热电和拓扑绝缘体中的应用

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摘要

Bismuth telluride (Bi_2Te_3) and its alloys are the best bulk thermoelectric materials known today. In addition, stacked quasi-two-dimensional (2D) layers of Bi_2Te_3 were recently identified as promising topological insulators. In this paper we overview our results on "graphene-inspired" exfoliation of crystalline bismuth telluride films with a thickness of just a few atoms. The atomically thin films were suspended across trenches in Si/SiO_2 substrates, and subjected to detail material characterization. The presence of the van der Waals gaps allowed us to disassemble Bi_2Te_3 crystal into its quintuple building blocks - five mono-atomic sheets -consisting of Te~((1))-Bi-Te~((2))-Bi-Te~((1)). By altering the thickness and sequence of atomic planes we were able to create "designer" quasi-2D crystalline films, change their composition, the type of charge carriers as well as other properties. The exfoliated quintuples and ultra-thin films have low thermal conductivity, relatively high electrical conductivity and enhanced thermoelectric properties. The obtained results pave the way for producing stacks of crystalline bismuth telluride quantum wells with nearly infinite potential barriers, strong spatial confinement of charge carriers and acoustic phonons, beneficial for thermoelectric devices. The developed technology for producing free-standing quasi-2D layers of Te~((1))-Bi-Te~((2))-Bi-Te~((1)) also creates an impetus for further investigation of the topological insulators.
机译:碲化铋(Bi_2Te_3)及其合金是当今已知的最好的块状热电材料。此外,Bi_2Te_3的堆叠准二维(2D)层最近被确定为有前途的拓扑绝缘体。在本文中,我们概述了有关厚度仅为几个原子的碲化铋铋薄膜“受石墨烯启发”剥离的结果。原子薄膜悬浮在Si / SiO_2衬底的沟槽中,并进行详细的材料表征。范德华间隙的存在使我们能够将Bi_2Te_3晶体分解成五重结构块-五个单原子片-由Te〜((1))-Bi-Te〜((2))-Bi-Te〜 ((1))。通过改变原子平面的厚度和顺序,我们能够创建“设计者”准2D晶体膜,改变其组成,电荷载流子的类型以及其他特性。剥离的五元组和超薄薄膜具有较低的热导率,相对较高的电导率和增强的热电特性。获得的结果为生产具有几乎无限的势垒,强大的电荷载流子和声子空间限制的晶体碲化铋铋量子阱堆叠铺平了道路,对热电器件是有益的。生产Te〜((1))-Bi-Te〜((2))Bi-Te〜((1))的准2D层的先进技术也为进一步研究拓扑提供了动力绝缘子。

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  • 会议地点 Las Vegas NV(US);Las Vegas NV(US);Las Vegas NV(US)
  • 作者单位

    Nano-Device Laboratory, Department of Electrical Engineering, University of California - Riverside, Riverside, California 92507, USA Material Science and Engineering Program, University of California - Riverside,Riverside, California 92507, USA;

    Nano-Device Laboratory, Department of Electrical Engineering, University of California - Riverside, Riverside, California 92507, USA Material Science and Engineering Program, University of California - Riverside,Riverside, California 92507, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
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