TiO_2 Thin Films and Doped TiO_2 Nanolaminates, Their Structure and its Effect on Their Photocatalytic Properties

摘要

Atomic Layer Deposition (ALD) has been used to deposit undoped, doped and nanolaminate structures based on titanium dioxide and the dependence of their photocatalytic activity on the film structure has been studied. The activity of undoped films has been found to reach its peak at a certain film thickness. The reason for this may be the quantum size effect. Titanium dioxide films have been also doped by transition metals and nitrogen. Nitrogen has proven to be the best dopant to increase the photocatalytic activity.