Development of laser deposition package for modeling of EUV sources for microlithography

摘要

A laser energy deposition model has been incorporated into the MHRDR-EUVL magnetohydrodynamic (MHD) modelof EUV sources for microlithography. The model includes inverse-bremsstrahlung absorption, resonance absorption,and reflection of laser radiation from the plasma critical surface. The plasma evolution is simulated in parallel with theMHRDR-EUVL (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code.Convenient user-options include simple specification of the full width at half maximum (FWHM) of typical laserprofiles, such as Gaussian profiles in space and time. The new laser deposition capability will allow MHRDR-EUVL tocalculate the evolution of magnetized laser-produced plasmas. Magnetic fields can reduce the loss of plasma energycaused by plasma expansion and thermal conductivity.