首页> 外文会议>Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii >EFFECTS OF HYDROGEN ON ELECTRICAL PROPERTIES OF N-TYPE PHOSPHOROUS-DOPED DIAMOND EPITAXIAL FILM
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EFFECTS OF HYDROGEN ON ELECTRICAL PROPERTIES OF N-TYPE PHOSPHOROUS-DOPED DIAMOND EPITAXIAL FILM

机译:氢对N型磷掺杂金刚石外延膜电学性能的影响

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An phosphorous (P) doped diamond epitaxial film grown by GSMBE using methane and tri-n-butylphosphine showed an n-type conduction and a fall of the electrical conductivity (σ) after the surface oxidation. From C1s XPS measurements the component of 284.2 eV which has been assigned to hydrogenated carbon in the near surface region decreased. Comparing the electrical measurements with the XPS observation, we found that the hydrogenated carbon contributes not to the n-type conduction but to the high σ. The variable activation energy of σ of 0.24 and 0.12 eV which were low relative to an isolated P donor level of 0.43 eV in diamond are explained qualitatively by a theoretical prediction about a codoping of P donors and H acceptors. The electron mobility at 450℃ was obtained to be 1010 cm~2/Vs when the σ and the Hall coefficient were analyzed by considering the existence of P donors and H acceptors.
机译:通过GSMBE使用甲烷和三正丁基膦生长的掺磷(P)的金刚石外延膜在表面氧化后显示出n型导电性和电导率(σ)的下降。从C1s XPS测量结果来看,已分配给近表面区域中氢化碳的284.2 eV分量减少了。将电学测量值与XPS观测值进行比较,我们发现氢化碳不是对n型传导的贡献,而是对高σ的贡献。通过关于P供体和H受体共掺杂的理论预测,定性地解释了σ的可变活化能为0.24和0.12 eV,相对于金刚石中孤立的P供体水平为0.43 eV较低。考虑到P供体和H受体的存在,分析了σ和霍尔系数,得出450℃下的电子迁移率为1010 cm〜2 / Vs。

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