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BaAl_2S_4:Eu Thin-Film EL Devices Prepared by Pulsed Laser Ablation Technique

机译:脉冲激光烧蚀技术制备的BaAl_2S_4:Eu薄膜EL器件

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摘要

BaAl_2S_4:Eu phosphor is the most promising material as the blue emitting thin film electroluminescent (TFEL) devices. We reported the BaAl_2S_4:Eu TFEL devices which were prepared by the two-targets-pulse electron beam evaporation technique. The BaAl_2S_4:Eu TFEL devices shown a high luminance of 65 cd/m~2 under driving 50 Hz pulse voltage and the CIE color coordinates was (X=0.12 and Y=0.10). BaAl_2S_4:Eu phosphor is composed of elements which have different vapor pressure. Therefore deposition of these multinaly compound thin films is difficult. We think that flash evaporation technique, pulsed laser ablation (PLA) technique and two-targets-pulse electron beam evaporation technique solved this problem. These deposition techniques supply to momentary energy for the target. There is a few report of BaAl_2S_4:Eu blue emitting TFEL devices. In this study, we were prepared the BaAl_2S_4:Eu blue emitting TFEL devices by the PLA technique. Generally, the thin films that were ablated by the PLA technique are expected to high quality and stoichiometric composition with keeping the composition of starting materials. ZnS:Mn and SrS:Ce TFEL devices had been prepared by the PLA technique were reported.
机译:BaAl_2S_4:Eu荧光粉是发蓝光薄膜电致发光(TFEL)器件中最有前途的材料。我们报道了通过两靶脉冲电子束蒸发技术制备的BaAl_2S_4:Eu TFEL器件。 BaAl_2S_4:Eu TFEL器件在驱动50 Hz脉冲电压下显示出65 cd / m〜2的高亮度,CIE色坐标为(X = 0.12和Y = 0.10)。 BaAl_2S_4:Eu荧光粉由具有不同蒸气压的元素组成。因此,这些多层复合薄膜的沉积是困难的。我们认为闪蒸技术,脉冲激光烧蚀(PLA)技术和两目标脉冲电子束蒸发技术解决了这个问题。这些沉积技术为靶提供瞬时能量。有一些关于BaAl_2S_4:Eu蓝色发射TFEL器件的报道。在这项研究中,我们通过PLA技术制备了BaAl_2S_4:Eu蓝色发射TFEL器件。通常,期望通过PLA技术烧蚀的薄膜具有高质量和化学计量组成,同时保持原料的组成。报道了用PLA技术制备的ZnS:Mn和SrS:Ce TFEL器件。

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