Deposition of hydrogenated amorphous silicon-carbon alloy films by magnetron glow discharge plasma

摘要

Hydrogenated amorphous silicon carbide was prepared by reactive magnetron sputtering. Materials obtained by sputtering of carbon target in the atmosphere of argon-silane mixture as well as by spattering of silicon target in the atmosphere of argon-methane mixture were compared. Electrical and optical absorption spectra of material obtained by various methods were found out.