首页> 外文会议>Second International Symposium on Cold Cathodes May 13-14, 2002 Philadelphia, Pennsylvania >ELECTRON EMISSION MICROSCOPY MEASUREMENTS OF NITROGEN AND SULFUR DOPED CARBON FILMS
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ELECTRON EMISSION MICROSCOPY MEASUREMENTS OF NITROGEN AND SULFUR DOPED CARBON FILMS

机译:氮和硫掺杂碳膜的电子发射显微测量

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We have employed a high resolution electron emission microscope to image photo-electron emission and field emission from nitrogen and sulfur doped carbon films. The measurements obtained as a function of sample temperature up to 1000℃ display thermionic field emission images. N-doped hydrogen terminated diamond films have been produced by MPCVD with a N/C gas phase ratio of 48. The hydrogen terminated surfaces display uniform emission in photo electron emission microscopy at all temperatures. No field emission microscopy images are detectable below 500℃. Depending on the surface treatment of the nitrogen doped diamond films, we find enhanced electron emission at elevated temperatures starting at around 600℃ that increases with increasing temperature. At elevated temperatures the electron emission for the nitrogen doped films as imaged with the electron emission microscope shows a uniform distribution over a wide surface region. Sulfur doped carbon films exhibit electron emission at room temperature originating mainly from 'hot spots' on the surface. At temperatures as low as 340℃ we find a strong increase in electron emission from those localized regions.
机译:我们已经使用高分辨率电子发射显微镜对氮和硫掺杂的碳膜的光电子发射和场发射成像。根据样品温度(最高至1000℃)而获得的测量结果显示了热电子场发射图像。通过MPCVD以N / C气相比为48的方式制备了N掺杂的氢封端的金刚石薄膜。在所有温度下,氢封端的表面在光电子发射显微镜中均显示出均匀的发射。在低于500℃时无法检测到场发射显微镜图像。根据氮掺杂金刚石薄膜的表面处理,我们发现在大约600℃开始的高温下电子发射增强,并且随着温度的升高而增加。在升高的温度下,用电子发射显微镜成像的氮掺杂膜的电子发射在宽的表面区域上显示出均匀的分布。硫掺杂的碳膜在室温下表现出电子发射,主要来自表面上的“热点”。在低至340℃的温度下,我们发现这些局部区域的电子发射大大增加。

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