【24h】

DEVICE CHARACTERISTICS OF THE PNP ALGAAS/INGAASN/GAAS DOUBLE HETEROJUNCTION BIPOLAR TRANSISTOR

机译:PNP ALGAAS / INGAASN / GAAS双异质结双极性晶体管的器件特性

获取原文
获取原文并翻译 | 示例

摘要

We have demonstrated a functional PnP double heterojunction bipolar transistor (DHBT) using AlGaAs, InGaAsN, and GaAs. The band alignment between InGaAsN and GaAs has a large ΔE_c and a negligible AEv, and this unique characteristic is very suitable for PnP DHBT applications. The metalorganic vapor phase epitaxy (MOCVD) grown Al_(0.3)Ga_(0.7)As/In_(0.03)Ga_(0.97)As_(0.99)N_(0.01)/GaAs PnP DHBT is lattice matched to GaAs and has a peak current gain of 25. Because of the smaller bandgap (E_g = 1.20 eV) of In_(0.03)Ga_(0.97)As_(0.99)N_(0.01) used for the base layer, this device has a low V_(ON) of 0.79 V, which is 0.25 V lower than in a comparable Pnp AlGaAs/GaAs HBT. And because GaAs is used for the collector, its BV_(CEO) is 12 V, consistent with BV_(CEO) of AlGaAs/GaAs HBTs of comparable collector thickness and doping level.
机译:我们已经证明了使用AlGaAs,InGaAsN和GaAs的功能性PnP双异质结双极晶体管(DHBT)。 InGaAsN和GaAs之间的能带对准具有较大的ΔE_c和可忽略的AEv,这种独特的特性非常适合PnP DHBT应用。金属有机气相外延(MOCVD)生长的Al_(0.3)Ga_(0.7)As / In_(0.03)Ga_(0.97)As_(0.99)N_(0.01)/ GaAs PnP DHBT与GaAs晶格匹配并具有峰值电流增益25。由于用于基础层的In_(0.03)Ga_(0.97)As_(0.99)N_(0.01)的带隙较小(E_g = 1.20 eV),因此该器件的V_(ON)较低,为0.79 V,它比同类的Pnp AlGaAs / GaAs HBT低0.25V。并且由于GaAs用于集电极,其BV_(CEO)为12 V,与具有相同集电极厚度和掺杂水平的AlGaAs / GaAs HBT的BV_(CEO)一致。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号