Obtaining thin layers of ZnO with magnetron sputtering method

摘要

This paper presents research results on the obtaining of ZnO thin layers using a method of physical vapor deposition, namely magnetron sputtering. They used two types of ZnO targets sintered and non sintered. Deposit layers was done by magnetron sputtering method in argon atmosphere. Rigorous characterization of the deposited layers was performed by analysis of electron microscopy SEM and HRTEM.