The Optical Properties of Nanostruetured Ta_2O_5 Films

摘要

Amorphous Ta_2O_5 films were prepared on Si (100) substrates by thermal oxidization. The film consisted of amorphous Ta_2O_5 nanostructure that grew vertically and compactly at a large range. It was found that Ta_2O_5 films became crystalline when annealed at or above 650℃ and remained amorphous below 650℃. The effects of annealing on the optical properties of Ta_2O_5 film were also discussed. It is estimated that the refraction indexes and the optical energy gaps of both amorphous Ta_2O_5 film and crystal one are stable. The optical energy gap of as-deposited Ta_2O_5 film is about 4.81 eV. The above results indicate that Ta_2O_5 films have a promising application in the optical devices.