首页> 外文会议>Quantum Electronics Conference amp; Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011 >Terahertz emission from indium oxide films on MgO substrates excited at a photon energy below the bandgap
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Terahertz emission from indium oxide films on MgO substrates excited at a photon energy below the bandgap

机译:在带隙以下的光子能量激发下,MgO衬底上的氧化铟膜的太赫兹发射

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摘要

Indium oxide (In2O3) films grown on MgO substrates by thermal oxidation were excited by femtosecond laser pulses having photon energy lower than the bandgap. The emission of terahertz (THz) pulse was observed using time domain spectroscopy in the reflection-geometry excitation. Results show that THz generation saturates at an excitation fluence of ~400 nJ/cm2. Although two-photon absorption has been ruled out, the actual THz emission mechanism and still has to be verified and is temporarily attributed to carriers from defect level absorption possibly being driven by a strain field due to the lattice mismatch between the In2O3 and the MgO substrate.
机译:通过飞秒激光脉冲激发通过热氧化在MgO衬底上生长的氧化铟(In2O3)薄膜,该飞秒激光脉冲的光子能量低于带隙。在反射几何激发中使用时域光谱法观察到了太赫兹(THz)脉冲的发射。结果表明,THz的产生在〜400 nJ / cm2的激发通量下达到饱和。尽管已经排除了两个光子的吸收,但是实际的THz发射机理仍然有待验证,并且暂时归因于由于In2O3与MgO衬底之间的晶格失配而可能由应变场驱动的缺陷能级吸收的载流子。

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