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Binding Energy Shifts for Cu and Ag UPD on Rh(lll) Determined by Online EC-XPS

机译:由在线EC-XPS确定的Cu和Ag UPD在Rh(III)上的结合能移位

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The nature of Cu and Ag underpotentially-deposited on Rh(111) was investigated by X-ray photoelectron spectroscopy (XPS). These underpotential deposition (UPD) systems present multipeak features, which were evaluated by cyclic voltammetry and in terms of binding energy shifts. The use of different electrolytes (sulfuric and perchloric acid) strongly affected the metallic coverage and slightly affected the UPD shifts. Through XPS, the examined surfaces were found to contain C, O, and S or Cl, which confirms the presence of anions and/or products of their reduction at the Rh(111) surface, in addition to the deposited metals. The binding energies for underpotentially-deposited Cu and Ag displayed negative shifts (to lower binding energy) with respect to both the bulk deposits and clean metal references. These negative shifts were discussed in terms of contributions from charge transfer, orbital rehybridization, and lattice strain.
机译:通过X射线光电子能谱(XPS)研究了在Rh(111)上未充分沉积的Cu和Ag的性质。这些欠电位沉积(UPD)系统具有多峰特征,这些特征已通过循环伏安法和结合能位移评估。使用不同的电解质(硫酸和高氯酸)会严重影响金属覆盖率,并会轻微影响UPD的变化。通过XPS,发现所检查的表面含有C,O和S或Cl,这证实了除了沉积的金属外,在Rh(111)表面还存在阴离子和/或它们还原的产物。相对于整体沉积物和干净的金属参比,欠电位沉积的Cu和Ag的结合能显示出负移(以降低结合能)。从电荷转移,轨道再杂交和晶格应变的贡献方面讨论了这些负位移。

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