Scrubber clean process induced CDM ESD-like: CSM (Charged Surface Model) event caused by dummy patterns

机译：洗涤塔清洁过程引起的CDM ESD样：由假图案引起的CSM（带电表面模型）事件

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This paper describes a process-induced damage phenomenon on the Poly-Insulator-Poly (PIP) capacitor of mixed-mode circuit during the scrubber clean after Spin-On-Glass (SOG) layer deposition. The damage mechanism is the generated charges during the scrubb

机译：本文描述了自旋玻璃（SOG）层沉积后洗涤塔清洁过程中混合模式电路的多绝缘体（PIP）电容器上的过程引起的损坏现象。损坏机理是在擦洗过程中产生的电荷

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来源
《Programmable Logic, 2008 4th Southern Conference on; Phoenix,AZ,USA》||P.315-318|共4页
会议地点 PhoenixAZUSA
作者
Jian-Hsing Lee; Shih; J.R.; Chi-Lun Huang; Hsieh; S.; Wu; K.;
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原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
capacitors; mixed analogue-digital integrated circuits; semiconductor-insulator-semiconductor devices; surface cleaning; charged surface model; dummy metal-1 stripe; dummy patterns; mixed-mode circuit; parasitic capacitor; poly-insulator-poly capacitor; scrubber c;

机译：电容器;混合模拟数字集成电路;半导体-绝缘体-半导体器件;表面清洁;带电表面模型;虚拟金属1条带;虚拟图案;混合模式电路;寄生电容器;多绝缘体-多聚电容器;洗涤器c;

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Scrubber clean process induced CDM ESD-like: CSM (Charged Surface Model) event caused by dummy patterns

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