IN-SITU QUARTZ CRYSTAL MICROBALANCE INVESTIGATION OF ATOMICE LAYER DEPOSITION OF Cu_3N

摘要

Cu_3N is a promising material for optical data storage and copper metallisation. Upon heating the metastable Cu_3N decomposes into metallic copper and nitrogen gas. Films have been grown with a novel ALD (Atomic Layer Deposition) process using copper(II) hexafluoro-acetylacetonate (Cu(hfac)_2), water and ammonia as precursors. By adding an intermediate water pulse the growth rate was enhanced on oxide substrates. The water was used with the purpose of producing sacrificial oxide layers. The mass changes during the deposition cycles were measured by in-situ Quartz Crystal Microbalance (QCM) technique. Extensive hfac removal was observed during Cu(hfac)_2 adsorption, yielding a surface composition of Cu(hfac)_(0.4) (ad) for short pulses.