首页> 外文会议>Proceedings vol.2003-29; Epitaxial Growth of Functional Oxides Symposium and Electrochemical Society Meeting; 20031012-17; Orlando,FL(US) >SOL-GEL DERIVED TEXTURED BARIUM STRONTIUM TITANATE THIN FILMS FOR MICROWAVE DIELECTRIC APPLICATIONS
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SOL-GEL DERIVED TEXTURED BARIUM STRONTIUM TITANATE THIN FILMS FOR MICROWAVE DIELECTRIC APPLICATIONS

机译:用于微波介质应用的溶胶凝胶衍生的钛酸锶钡薄膜

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摘要

Highly (100) oriented Ba_(0.5)Sr_(0.5)TiO_3 {BST50} and Ba_(0.6)Sr_(0.4)TiO_3 {BST60} thin films were successfully grown on LaAlO_3 (LAO) (100) substrates by sol-gel technique. The in-plane epitaxial nature of these films was confirmed by X-ray pole figure analysis and Rutherford backscattering (RBS) channeling measurements. The effect of manganese (Mn) doping and BST:MgO heterostructure on the nature of epitaxial growth and electrical behavior of (100) oriented (BST50) thin films were studied. These films exhibited excellent phase shift and insertion loss characteristics at microwave frequencies. The BST50 film with 3 at% Mn doping showed improvement in the phase shift (337° at 339 V and at ~14 GHz) and BST:MgO film showed the considerable reduction in the insertion losses (~3.4 dB at 400 V and at 16.25 GHz) for the phase shifters measured in the high frequency region.
机译:通过溶胶-凝胶技术在LaAlO_3(LAO)(100)衬底上成功生长了高度(100)取向的Ba_(0.5)Sr_(0.5)TiO_3 {BST50}和Ba_(0.6)Sr_(0.4)TiO_3 {BST60}薄膜。通过X射线极图分析和卢瑟福背散射(RBS)通道测量,证实了这些薄膜的面内外延特性。研究了锰(Mn)掺杂和BST:MgO异质结构对(100)取向(BST50)薄膜的外延生长性质和电学行为的影响。这些薄膜在微波频率下表现出出色的相移和插入损耗特性。锰掺杂量为3 at%的BST50膜显示出相移的改善(在339 V和〜14 GHz时为337°),而BST:MgO膜显示出插入损耗的显着降低(在400 V和16.25时为〜3.4 dB) GHz),用于在高频区域中测量的移相器。

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