首页> 外文会议>2018年第79回応用物理学会秋季学術講演会講演予稿集 >A perverse transparent oxide semiconductor, La:BaSnO_3
【24h】

A perverse transparent oxide semiconductor, La:BaSnO_3

机译:反向透明氧化物半导体,La:BaSnO_3

获取原文
获取原文并翻译 | 示例

摘要

La-doped BaSnO_3(LBSO) is one of the most promisingtransparent oxide semiconductors (TOSs) since its single crystal exhibitsahigh mobility of 320 cm~2 V~(−1) s~(−1).However, the electron mobility of LBSOthinfilms are less than150 cm~2 V~(−1) s~(−1).Electron scatteringsat threading dislocations caused by the film/substrate lattice mismatchare widely considered as the main origin of mobility suppression in LBSO films.Nevertheless, the mobilityvalueofdepositedLBSO epitaxial films still below 100 cm~2 V~(−1) s~(−1)even ifBaSnO_3 single crystal substrateswere usedto minimize the lattice mismatch.In addition,the electron transport properties of LBSO films were not significantly affected by thelattice mismatch andexhibiteda strong thickness dependence.
机译:La掺杂BaSnO_3(LBSO)是最有前途的透明氧化物半导体(TOSs)之一,因为其单晶具有320 cm〜2 V〜(-1)s〜(-1)的高迁移率。小于150 cm〜2 V〜(-1)s〜(-1)。由于薄膜/基板晶格失配引起的电子错位引起的电子散射被广泛认为是LBSO薄膜抑制迁移的主要来源。即使使用BaSnO_3单晶衬底来最小化晶格失配,在100 cm〜2 V〜(-1)s〜(-1)以下,LBSO薄膜的电子输运性能也不会受到显着影响,并且表现出很强的厚度依赖性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号