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Prismatic stacking faults in epitaxially lateraly overgrown GaN

机译:外延横向过生长GaN中的棱柱堆叠缺陷

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摘要

We report on the presence of optically active stacking faults on basal and prismatic planes in epitaxially laterally overgrown GaN (ELOG) on {1122} facets. The structure of the faults has been analyzed using dffraction contrast electron microscopy. The prismatic plane stacking faults occur on {1120} planes, involving a lattice displacement of 1/2 < 1101 > , parallel to the fault plane. They appear as jogs connecting basal-plane stacking faults, the latter with a lattice displacement of 1/6 < 2023 > . These faults are observed only in laterally overgrown regions, which grow along {1122} planes, indicating that their formation is closely related to the orientation of the growth surface. Possible formation mechanisms of these faults are discussed. Cathodoluminescence observations indicate the absence of band edge emission at these faults.
机译:我们报告了{1122}刻面上外延横向过长的GaN(ELOG)的基面和棱柱面上存在光学活性堆叠断层的情况。断层的结构已经使用衍射对比电子显微镜进行了分析。棱柱面堆叠断层发生在{1120}面上,涉及与断层平面平行的1/2 <1101>的晶格位移。它们表现为连接基面堆叠断层的飞梭,后者的晶格位移为1/6 <2023>。这些断层仅在沿{1122}平面生长的横向过度生长区域中观察到,表明它们的形成与生长表面的方向密切相关。讨论了这些断层的可能形成机理。阴极发光观察表明在这些断层处不存在带边缘发射。

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