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Simulation of Avalanche Injection Filamentation in MOSFET's and IGBT's

机译:MOSFET和IGBT中雪崩注入细丝的仿真

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摘要

On the basis of 2-D numerical simulation the isothermal current instability and filamentation have been investigated in the MOSFET's and IGBT's. It is stated that exceeding of some critical voltage value and current density in these devices provides negative differential resistance (NDR) due to the avalanche injection conductivity modulation and current filamentation of the source-drain (emitter-collectorA) spacing.
机译:在二维数值模拟的基础上,研究了MOSFET和IGBT中的等温电流不稳定性和细丝化。据指出,由于雪崩注入电导率调制和源极-漏极(发射极-集电极A)间距的电流细丝化,在这些器件中超过某些临界电压值和电流密度会提供负的差分电阻(NDR)。

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