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Experimental demonstration of a vertical LOCOS Insulated Base Transistor

机译:垂直LOCOS绝缘基极晶体管的实验演示

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In this paper we demonstrate, for the first time, electrical results of vertical LOCOS based Insulated Base Transistors (IBT) fabricated in a 85 V BiCMOS process. Experimental results show that the devices exhibit dasiatransistor likepsila characteristics and show enhancements with respect to saturation current level when compared to MOSFET equivalents. Furthermore, a cathode cell structure with a MOSFET in parallel to the IBT displays superior performance when compared to devices where this is eliminated.
机译:在本文中,我们首次展示了在85 V BiCMOS工艺中制造的基于垂直LOCOS的绝缘基晶体管(IBT)的电学结果。实验结果表明,与MOSFET等效器件相比,该器件具有dasiatransistor likepsila特性,并在饱和电流水平方面有所增强。此外,与消除了IBT的器件相比,具有与IBT并联的MOSFET的阴极电池结构显示出卓越的性能。

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