首页> 外文会议>Physics, simulation, and photonic engineering of photovoltaic devices III >Ga-rich Ga_xIn_(1-x)P solar cells on Si with 1.95 eV bandgap for ideal Ⅲ-Ⅴ/Si photovoltaics
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Ga-rich Ga_xIn_(1-x)P solar cells on Si with 1.95 eV bandgap for ideal Ⅲ-Ⅴ/Si photovoltaics

机译:用于理想Ⅲ-Ⅴ/ Si光伏电池的具有1.95 eV带隙的Si上富含Ga的Ga_xIn_(1-x)P太阳能电池

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摘要

Theoretical models for Ⅲ-Ⅴ compound multijunction solar cells show that solar cells with bandgaps of 1.95-2.3 eV are needed to create ideal optical partitioning of the solar spectrum for device architectures containing three, four and more junctions. For Ⅲ-Ⅴ solar cells integrated with an active Si sub-cell, GaInP alloys in the Ga-rich regime are ideal since direct bandgaps of up to ~ 2.25 eV are achieved at lattice constants that can be integrated with appropriate GaAsP, SiGe and Si materials, with efficiencies of almost 50% being predicted using practical solar cell models under concentrated sunlight. Here we report on Ga-rich, lattice-mismatched Ga_(1057)In_(0.43)P sub-cell prototypes with a bandgap of 1.95 eV grown on tensile step-graded metamorphic GaAs_yP_(1-y) buffers on GaAs substrates. The goal is to create a high bandgap top cell for integration with Si-based Ⅲ-Ⅴ/Si triple-junction devices. Excellent carrier collection efficiency was measured via internal quantum efficiency measurements and with their design being targeted for multijunction implementation (i.e. they are too thin for single junction cells), initial cell results are encouraging. The first generation of identical 1.95 eV cells on Si were fabricated as well, with efficiencies for these large bandgap, thin single junction cells ranging from 7% on Si to 11% on GaAs without antireflection coatings, systematically tracking the change in defect density as a function of growth substrate.
机译:Ⅲ-Ⅴ型复合多结太阳能电池的理论模型表明,需要带隙为1.95-2.3 eV的太阳能电池才能为包含三个,四个和更多结的器件架构创建理想的太阳光谱光学分区。对于与有源Si子电池集成的Ⅲ-Ⅴ型太阳能电池,采用富Ga态的GaInP合金是理想的,因为在晶格常数下可实现高达〜2.25 eV的直接带隙,并且可以与适当的GaAsP,SiGe和Si集成使用实用的太阳能电池模型,在阳光集中的情况下,可以预测材料的效率接近50%。在这里,我们报道了在GaAs衬底上拉伸阶跃渐变型GaAs_yP_(1-y)缓冲层上生长的带隙为1.95 eV的富含Ga的,晶格不匹配的Ga_(1057)In_(0.43)P子电池原型。目标是创建一个高带隙顶部电池,以便与基于Si的Ⅲ-Ⅴ/ Si三结器件集成。通过内部量子效率测量测量了优异的载流子收集效率,并且其设计针对多结实现(即,对于单结电池而言它们太薄了),因此最初的电池结果令人鼓舞。还制造了第一代在硅上相同的1.95 eV电池,这些大带隙的薄单结电池的效率范围从Si上的7%到GaAs上的11%(不带抗反射涂层),系统地跟踪了缺陷密度的变化。生长底物的功能。

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  • 会议地点 San Francisco CA(US)
  • 作者单位

    Department of Electrical and Computer Engineering The Ohio State University Columbus, Ohio, USA;

    Department of Electrical and Computer Engineering The Ohio State University Columbus, Ohio, USA,Department of Materials Science Engineering The Ohio State University Columbus, Ohio, USA;

    Institute for Materials Research The Ohio State University Columbus, Ohio, USA;

    Department of Electrical and Computer Engineering The Ohio State University Columbus, Ohio, USA;

    Department of Electrical and Computer Engineering The Ohio State University Columbus, Ohio, USA,Department of Materials Science Engineering The Ohio State University Columbus, Ohio, USA,Institute for Materials Research The Ohio State University Columbus, Ohio, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    photovoltaic; solar cell; GalnP; metamorphic; lattice-mismatch; epitaxy; Ⅲ-Ⅴ; Si;

    机译:光伏太阳能电池; GalnP;变质晶格失配;外延Ⅲ-Ⅴ;硅;

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