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The thermodynamic spin magnetization of strongly correlated 2d electrons in a silicon inversion layer

机译:硅反型层中强相关2d电子的热力学自旋磁化

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A novel method invented to measure the minute thermodynamic spin magnetization of dilute two-dimensional fermions is applied to electrons in a silicon inversion layer. Interplay between the ferromagnetic interaction and disorder enhances the low temperature susceptibility by a factor of up to 7.5 compared with the Pauli susceptibility of non-interacting electrons. The magnetization peaks in the vicinity of the density where transition to strong localization takes place. At the same density, the susceptibility becomes extremely close to that of free spins (Curie susceptibility), indicating an almost perfect compensation of the kinetic energy toll associated with spin polarization by the energy gained from the ferromagnetic correlation. Nonetheless, the balance favors a paramagnetic phase over spontaneous magnetization.
机译:发明一种用于测量稀薄二维费米子的微小热力学自旋磁化强度的新颖方法,该方法应用于硅反型层中的电子。与非相互作用电子的保利敏感性相比,铁磁相互作用与无序之间的相互作用将低温敏感性提高了7.5倍。磁化强度在发生向局部定位过渡的密度附近达到峰值。在相同密度下,磁化率变得非常接近自由自旋的磁化率(居里磁化率),表明与铁磁极化相关的动能通量几乎可以由铁磁相关性获得的能量补偿。尽管如此,与自发磁化相比,天平更倾向于顺磁性相。

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